【作者】 孙天华； 胡彬彬； 杜祖亮；

【Author】 T.H.Sun,B.B.Hu,Z.L.Du Key Laboratory for Special Functional Materials of Ministry of Education,Henan University,Kaifeng 475004

【机构】 河南大学特种功能材料教育部重点实验室；

【摘要】 具有较小间距的纳米电极的制备对于纳米器件的构筑起着至关重要的作用。纳米压印技术在制备纳米电极方面具有独特的优势。本文利用纳米压印、反应离子束刻蚀和磁控溅射技术,成功制备了大面积的、具有良好周期结构的纳米电极。首先,通过纳米压印技术将电极模板复制在旋涂有PMMA的二氧化硅基底上,继而利用氧反应离子束刻蚀去除残余的PMMA。通过磁控溅射沉积金膜,经剥离后得到大面积、最小间距大约为200nm的金纳米电极。这为纳米器件的构筑提供了一个良好基础。更多还原

【Abstract】 Preparation of nano-electrodes with small gap size is important for the construction of nanodevices.Nanoimprint technology has unique advantages in the preparation of nano-electrode.In this study,large area nano-electrodes with small periodic structure were prepared using nanoimprint technology,reactive-ion etching and magnetron sputtering technology.The electrode template was imprinted on the silica substrate spin-coating PMMA by nanoimprint.A residual thickness of PMMA was subsequently removed by oxygen plasma etching.Nano-electrodes with a gap size as small as 200 nm were achieved by the use of a metal lift-off technique after sputtering gold.This provides a foundation for study of nano-devices.更多还原