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二维电子倍增器件特性测试和系统模拟的新方法

New Method for the Measurement and Simulation on the Characteristics of Two-Dimensional Electron Multipliers

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【作者】 向嵘陈立李野吴奎姜德龙王新田景全

【Author】 Xiang Rong~(1,2) Chen Li~1 Li Ye~1 Wu Kui~1 Jiang Delong~1 Wang Xin~1 Tian Jingquan~1 (1.Changchun University of Science and Technology,Changchun 130022,China; 2.China mechanical equipment research academy,Beijing 100089,China)

【机构】 长春理工大学中国机械装备研究院

【摘要】 文中给出了二维电子倍增器件倍增特性测试和像管动态模拟的UV光电法的结构原理,指出了电流密度分布均匀的面电子源的选择是关键;测量了MCP(或覆离子壁垒膜)电子增益和膜层电子透过特性,给出了死电压及其与膜厚的关系,指出了其实用性;首次提出了等效阴极概念,论述了双MCP测试系统的结构原理,即用UV直接激发MCP1所致电子发射替代替代Au薄膜的光电发射,藉以测量另一块MCP2的特性的UV激发新方法,指出了其在离子壁垒膜对离子透阻特性研究中的应用前景。

【Abstract】 The structural principle of UV photoelectric method for the measurement of the multiplied characteristics of two dimensional electron multipliers and the simulation of the dynamic characteristics of the image-tube were given in this paper.It was shown that the choice of surface electron source with a uniform current density is the key point.Using this method,the electron gain and the transmission characteristic of the MCP(or the MCP with an ion barrier film) were measured.The relationship between the dead-voltage and the thickness of the ion barrier film and it’s applications were given.For the first time,the concept of"equivalent cathode"was proposed.The test principle of UV excitation method for double MCP performance was shown in detail;in this method,the obtained electron emission from MCP1excited by the UV source replaced that electrons from Au thin film,and using these electron emissions to measure the performance of another MCP2.The application prospect of this method on the measurement of the ions transmission and stopping characteristic though the ion barrier film were shown.

  • 【会议录名称】 第八届全国信息获取与处理学术会议论文集
  • 【会议名称】第八届全国信息获取与处理学术会议
  • 【会议时间】2010-08-06
  • 【会议地点】中国山东威海
  • 【分类号】TN152
  • 【主办单位】中国仪器仪表学会
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