【作者】 王云飞； 陈学康； 郑阔海； 李中华； 王兰喜； 杨生胜； 冯展祖； 高欣；

【Author】 Wang Yunfei~*,Chen Xuekang,Zheng Kuohai,Li Zhonghua,Wang Lanxi,Yang Shengsheng,Feng Zhanzu,Gao Xin (Lanzhou Institute of Physics,National Laboratory of Vacuum & Cryogenics Technology and Physics,Lanzhou 730000,China)

【机构】 兰州物理研究所真空低温技术与物理国家重点实验室；

【摘要】 本文采用脉冲激光沉积方法在Al₂O₃（0001）基底上,500℃的衬底温度条件下,制备出了具有高度C.轴择优取向的氧化锌薄膜。用自行研制的同轴源型原子氧地面模拟装置,以1.62×10¹⁶AO·cm^-2·s^-1的原子氧束流强度（氧原子能量约5eV）对制备的薄膜进行了不同时间（30、60、90和120min）的处理。通过X射线衍射（XRD）、透射光谱和拉曼光谱等分析手段对原子氧处理前后薄膜的结构及光学特性进行了分析。氧化锌薄膜的结晶质量随原子氧作用时间增加而显著变好,晶粒尺寸呈变大趋势,缺陷浓度明显降低;氧化锌薄膜的禁带宽度随原子氧作用时间增加而变小。采用本方法处理的氧化锌薄膜,可用于制备高性能的氧化锌基光电器件。更多还原

【Abstract】 The ZnO films were grown by pulsed laser deposition（PLD）on Al₂O₃（0001）substrate held at 500℃,and bombarded with a 5eV atomic oxygen（AO）beam,at a flow rate of 1.62×10¹⁶cm^-2·s^-1for 30min,60min,90min and 120min,respectively.The microstructures and optical properties of the ZnO films before and after the oxygen bombardment were characterized with X-ray diffraction（XRD）,ultraviolet visible spectroscopy（UV-vis）and Raman spectroscopy.The results show that AO treatment significantly affects the microstructures and optical properties of the ZnO films with a preferential growth orientation along C-axis.For example,as the bombardment time increases,the defect density decreases with increased grain size;whereas its band gap narrows.We suggest that AO treatment considerably improves the quality of the ZnO films used as a photoelectric device material.更多还原