【作者】 张厚亮； 吕学超； 任大鹏； 李嵘； 赖新春； 杨兴文；

【机构】 中国工程物理研究院；

【摘要】 采用Ar~+离子束对U薄膜表面进行反应溅射,通过白光干涉仪和台阶仪的测量与分析,着重研究Ar~+离子束溅射能量、入射角度对其表面粗糙度Ra的影响,并与Ar~+离子束刻蚀实验的比对;结果表明,以30°角入射,随溅射时间的增加,能量为0.5keV的Ar~+离子束较1.0keV,U薄膜表面粗糙度趋于减小,表面愈光滑,溅射深度仅限于纳米级,而对金属Mo的刻蚀效果相比与之相反。Ar~+离子束溅射对材料表面具有纳米级超精细抛光的效果,辅之于离子柬微米级刻蚀减薄,将有助于U薄膜表面精细加工。更多还原

【Abstract】 Ar+ ion beam was used to sputter the uranium film surface.With using white light interferometer,the influence of energy and incidence angle of ion beam on roughness of uranium film was researched.Result is,with incidence angle of 30°,while sputter time increased,roughness of uranium film which was sputtered by Ar+ ion beam of 0.5 KeV is smaller than that of 1.0 keV.The depth of sputter is a few nanometers.Sputter on the surface of Mo metal is on the contrary of uranium.Ion beam sputter has the effect of fine polishing on material surface.With the assistance of ion thinning,it can be used in precision machining of film.更多还原