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高择优取向锡镍合金电沉积层的结构与沉积过程的原位STM研究

In situ STM Studies on Electrodeposltion and Structure of Sn-Ni Alloy Deposits of High Preferential Orientation

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【作者】 黄令颜佳伟魏洪兵杨防祖许书楷周绍民

【Author】 Ling Huang Jia-Wei Yan Hong-Bing Wei Fang-Zu Yang Shu-Kai Xu Shao-Min Zhou (Department of Chemistry,College of Chemistry and Chemical Engineering,Xiamen University,361005,Xiamen)

【机构】 厦门大学化学化工学院化学系

【摘要】 利用线性电位扫描技术研究了甘氨酸对锡、镍电沉积过程的影响,采用 X-射线衍射和扫描隧道显微镜分析了 Sn-Ni 合金沉积层的相结构、表面形貌和沉积的初期行为。结果表明在焦磷酸盐体系中添加甘氨酸可以获得了表面光亮、均匀的 Sn-Ni 沉积层,Sn-Ni 合金层呈现(110)高择优取向,该 Sn-Ni 合金沉积层的物相是γ-Ni3Sn2金属化合物。合金电沉积的初期是以三维岛状模式生长,基本沿袭基底铜表面结构;高过电位使成核速率增大,表面晶粒变得细小.沉积后期出现择优取向生长.

【Abstract】 Effects of glycine on Sn and Ni electrodeposition were studied by linear potential sweep.Structure and initial stages of Sn-Ni alloy electrodeposition were measured by XRD and scanning tunneling microscopy (STM).Experimental results showed that the electrodeposited Sn-Ni alloy deposits exhibit(110)highly preferred orientation,the phase structure of the Sn-Ni alloy deposit is γ-Ni3Sn2.The highly(110)preferred orientation indicates that the atom row corresponding to the texture axis stands exactly normal to the copper surface in most of crystallites.The preferred orientation of deposit film depends on the conditions of electrodeposition,such as temperature,current density,bath composition,pH,etc.The highly(110)preferred orientation of the Sn-Ni alloy deposits may be ascribed to the presence of adsorbed atomic hydrogen on electrode surface,which inhibit the rate of growth of(110)facets,finally the slow-growing facets survive.In initial stages of alloy electrodepoaition,the growth of crystallites is a three-dimensional island.The rate of nucleation is increased by increase of deposition overpotential.The preferred orientation growth of Sn-Ni alloy deposits occur at last stages of alloy electrodeposition.

  • 【会议录名称】 2007年上海市电子电镀学术年会论文集
  • 【会议名称】2007年上海市电子电镀学术年会
  • 【会议时间】2007-11
  • 【会议地点】中国上海
  • 【分类号】TQ153
  • 【主办单位】上海市电子学会电子电镀专委会、上海市电镀协会
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