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电结晶法制铜钴多层膜及其结构与磁性能研究
Study of Structure and GMR of Electrodeposited Cu/Co Multilayers
【Author】 Hu Ying Shi Xinhong Cao Weimin Yin Renhe (Department of Chemistry School of Science Shanghai University Shanghai 200444)
【机构】 上海大学理学院化学系;
【摘要】 以单晶 Si(111)为基底,在硼酸镀液体系中采用电结晶法制各 Cu/Co 多层膜,确定了工艺条件,用 X 射线衍射 (XRD)对多层膜的结构进行了表征,显示多层膜具有超晶格结构和良好周期性,并用物性测量系统 PPMS 测试了不同结构 Cu/Co 多层膜的磁性能,结果表明:巨磁阻 GMR 性能与多层膜结构有关,GMR 值随 Co 磁性层厚度增长先增大后减小, 有一极值;随着 Cu 非磁性层厚度的增加 GMR 值发生周期性的振荡;随周期数 N 的增大,GMR 值先增大,在 N 为60时达到了90%,随着 N 的继续增加而减小,当达到80周期时,GMR 值趋于稳定。
【Abstract】 Cu/Co multilayers were prepared on semiconductor silicon by using double-bath method containing boric acid solution. The technical conditions were determined.The structure of multiplayers were examined by XRD.It has been shown that:the multilayers had periodic structure and formed a superlattice structure.The correlation between structure of miltilayers and GMR was studied.The GMR value increased and then decreased with Co layer thickness,reached a peak,and changed periodically when Cu layer thickness increased With stacking number increased,the GMR value increased firstly and then fell.A GMR value as large as 90% was found when N increased to 60.while N reached 80,the GMR value was constant.
【Key words】 electrocrystalization; multilayers; X-ray diffraction; GMR;
- 【会议录名称】 2005年上海市电镀与表面精饰学术年会论文集
- 【会议名称】2005年上海市电镀与表面精饰学术年会
- 【会议时间】2005-05
- 【会议地点】中国上海
- 【分类号】TQ153.1
- 【主办单位】上海市电子学会电子电镀专委会、上海市电镀协会