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光敏性杂化SiO2波导薄膜的制备、表征及应用
Fabrication,characterization and application of photosensitive hybrid SiO2 optical waveguide thin film
【作者】 王玥; 吴远大; 李建光; 安俊明; 王红杰; 张家顺; 尹小杰; 胡雄伟;
【Author】 WANG Yue WU Yuan-da LI Jian-guang AN Jun-ming WANG Hong-jie ZHANG Jia-shun YIN Xiao-jie HU Xiong-wei (R&D Center of Optoelectronics,Institute of Semiconductors of Chinese Academy of Sciences,Beijing 100083,China)
【机构】 中国科学院半导体研究所光电子研究发展中心;
【摘要】 利用有机/无机杂化方法制备了光敏性溶胶-凝胶(sol-gel)SiO2材料,在预生长了18μm 厚的 SiO2上包层的硅基片上旋涂成膜.经前烘、紫外曝光、后烘的薄膜在5μm×5μm 的扫描范围内的表面粗糙度只有0.266nm, 表面起伏度只有0.336nm.利用紫外光直写技术,制作出条形波导器件.SEM 照片表明波导端面形状较好,侧壁陡直.对1×4多模干涉型分束器进行初步的通光测试,观察到分光效果较好的近场输出图像.
【Abstract】 Photosensitive sol-gel SiO2 materials were synthesized by organic-inorganic hybrid method,and were spun on silicon substrate.After the process of prebaking,UV-light exposure and postbaking,the surface of as-deposited fill was very smooth,with roughness just 0.266nm and undulation just 0.336nm in a 5μm×5μm scanning square.The strip optical waveguides and 1×4 MMI splitter were fabricated by the means of UV-light imprinting technology,with good-shape section and steep sidewalls.Good mode profile for the splitter was measured.
【Key words】 sol-gel; UV-lightimprinting; hybridization; optical waveguide; splitter;
- 【会议录名称】 第六届中国功能材料及其应用学术会议论文集(1)
- 【会议名称】第六届中国功能材料及其应用学术会议
- 【会议时间】2007-11
- 【会议地点】中国湖北武汉
- 【分类号】TB383.2
- 【主办单位】重庆仪器材料研究所、中国仪器仪表学会仪表材料分会、国家仪表功能材料工程技术研究中心