【作者】 顾颖波； 黄建斌； 王从曾； 张连宝； 苏学宽；

【Author】 GU Ying-bo, HUANG Jian-bing, WANG Cong-zeng, ZHANG Lian-bao, SU Xue-kuan, MA Jie (School of Material Science and Engineering, Beijing University of technology, Beijing, 100022, China)

【机构】 北京工业大学 材料科学与工程学院；

【摘要】 采用多弧离子镀的方法,在W18Cr4V基体表面制备一层Ti-Cu-N多元复合膜。并探讨靶的开放时间、靶的工作弧电流、氮分压、基体温度、负偏压及试样距靶的距离等不同工艺参数对Ti-Cu-N 多元复合膜硬度的影响。试验结果表明,在其它参数相同的情况下,膜硬度随负偏压(-100--300V) 的增大而增大,但负偏压过大时,离子强烈轰击基体引起部分溅射,使得膜厚较小;膜硬度随Cu 含量的减小而逐渐增大;N2分压在一定范围内变化时,Ti-Cu-N多元复合膜硬度随N2分压的增大先增大后减小。通过对这些影响规律分析研究,获得了多弧镀Ti-Cu-N多元复合膜的最佳参数,镀制的多元复合膜硬度达3400HV,晶粒尺寸小于50 μm。更多还原

【Abstract】 With the method of multiarc ion plating, preparation the layer Ti-Cu-N multivariate complex film at W18Cr4V matrix surface. Discuss target’s opening time, target’s working current flow, nitrogen partial pressure, and temperature of matrix, minus bias and distance the sample and target to the different influence Ti-Cu-N multivariate complex film’s thickness. The experiment result indicates Ti-Cu-N multivariate complex film’s thickness let down with distance test sample and target’s accretion; film’s hardness accretion with minus bias’s accretion, but if minus bias oversize, ion intensity bombard matrix to give rise to part sputter, film’s thickness let down, so that have a major influence when measure thickness, film’s hardness let down; when nitrogen partial pressure change in a purview, Ti-Cu-N multivariate complex film’s hardness first accretion and then let down with nitrogen partial pressure’s accretion. I acquired the best parameter setting with this influence rule, and analyses a test sample that in the parameter setting hardness is 3400HV, grain size below 50nm.更多还原