【作者】 李钒； 王习东； 张梅； 张登君；

【Author】 Li Fan, Wang Xidong, Zhang Mei, Zhang Dengjun (University of Science and Technology Beijing, Department of Physical Chemistry, Beijing 100083, China; Institute of Process Engineering, CAS, Beijing 100080, China)

【机构】 北京科技大学理化系； 中国科学院过程工程研究所；

【摘要】 对氨配合体系联氨(肼)还原化学镀进行了物理化学分析;以钴镀覆氮化硼为例进行了热力学分析,表明该过程热力学是可行的; 并在此后的实验验证中得以证实。尝试用动力学理论对用镍镀覆氮化硼的化学镀过程进行分析,讨论镀覆机理,建立了催化-界面自催化动力学模型,并推导了动力学表达式,并用其计算了镀覆动力学曲线,计算与实验结果符合得较好。更多还原

【Abstract】 Physical chemistry analysis was carried out for hydrazine reduction chemical plating in an ammonia complexation system. According the thermodynamic consideration, cobalt ion could be reduced in this system. Experimental results verify the consideration. In this investigation work it has done also to try analyzing the process of nickel planting BN for kinetics and discuss its mechanism. A model of interfacial autocatalysis is created and their mathematical expressions are deduced. Using the expressions a kinetic curve of the plating process is estimated and the estimating curve is very close to the experimental one.更多还原