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膜去溶进样ICP-MS法测定电子级高纯盐酸中痕量金属杂质
Determination of Trace Metal Elements in Electronic High Purity Hydrochloric Acid by ICP-MS With Membrane Desolvation
【Author】 MENG Rong,LI Hong-hua,HUANG Zhi-qi (Beijing Institute of Chemical Reagents, Beijing 100022, China)
【机构】 北京化学试剂研究所;
【Abstract】 Determination of thirty four trace metal elements in electronic high purity hydrochloric acid by ICP-MS (Standard Condition, Plasma Screen Condition) with membrane desolvation was described. Matrix effects were compensated by adding rhodium as the internal standard. Detection limits is 0.1 to 100 ng/L; the recovery of the method is 90%-110%. Long term RSD was less than 5%. The results from ICP and ICP-MS are correspondent. ICP-MS improves the accuracy and efficiency of analyses.
- 【会议录名称】 2005年全国无机质谱、同位素质谱和质谱仪器学术报告会论文集
- 【会议名称】2005年全国无机质谱、同位素质谱和质谱仪器学术报告会
- 【会议时间】2005-10
- 【会议地点】中国云南丽江
- 【分类号】O657.63
- 【主办单位】中国质谱学会无机质谱专业委员会、中国质谱学会同位素质谱专业委员会、中国质谱学会质谱仪器与教育专业委员会