【作者】 付光宗； 杨丰帆； 杨小红； 廖克俊； 刘高彬；

【Author】 Fu Guangzong Yang Fengfan Yang Xiaohong Liao Kejun Liu Gaobin Chongqing University .Chongqing, 400044 Chongqing Normal University, Chongqing,400047

【机构】 重庆大学；

【摘要】 当铝(Al)膜的厚度在100nm时,可以作为一种光学薄膜使用。用这种超薄铝膜制成光学元件具有耐激光以及损耗小等特点,在大功率激光系统中将得到应用。利用高纯铝靶,运用直流磁控溅射法制备了超薄铝膜,利用双光束分光光度计研究了其光学性质,测试了超薄铝膜的制备条件,如工作压强、靶基距、溅射时间等对薄膜的光学性质的影响。得到了工作压强、靶基距及溅射功率与薄膜的光学性质之间的关系。更多还原

【Abstract】 When the thickness of aluminum film is below 100nm, fine optical property can be obtained. For the advantages of resisting laser and low ullage, the ultrathin aluminum film can be applied in high -power laser system . Extra thin aluminum film was made of a 99. 99% pure aluminum target by DC reactive magnetron sputtering. The spec-trophometer was applied to analyze the transmission spectrum of samples. The relationship between spectrum and preparation conditions ,such as working pressure, distance of target and substrate, as well as the sputtering time were studied in this paper. The best conditions in preparation process were also given.更多还原