【作者】 徐芳； 沈上越； 谢静；

【Author】 XU Fang, SHEN Shang-yue, XIE Jing ,(Institute of Material Science and Engineering, China University ofGeoscince, Wuhan, Hubei 430074,China)

【机构】 中国地质大学材化学院；

【摘要】 本文按正交法设计了18个制备有机蒙脱石的实验,并对其进行表征.FTIR证实有机插层剂已进入蒙脱石.XRD结果表明有机蒙脱石的层间距最大达到了3.98 nm,同时根据XRD结果作者推测出蒙脱石插层结构排列演变模式为:单层平卧→倾斜单层→假三层→倾斜双层.其中倾斜单层结构中能达到的最大层间距3.22nm.更多还原

【Abstract】 The author designes 18 experiments to synthesize the organophilic montmorillonites using orthogonal method and then characterizes them. The FTIR spectrogram shows that the organic reagents have intercalated into the layer of MMT. Spacing of layer of MMT is detected using X-ray diffractometer and observed to have increased to the maximum 3.98 nm that is advanced, at the same time the models that HDTMA forms in the MMT are: the Iateral-monolayer→the paraffin-type-monolayer→the pseudotri-layer→the paraffin-type-bilayer. In the model of the the paraffin-type-monolayer the spacing can increase to 3.22 nm and the MMT at last is in the model of the paraffin-type-bilayer.更多还原