【作者】 杨凌露； 张改莲； 余尚先；

【Author】 Yang Linglu, Zhang Gailian, Yu Shangxian (Department of Chemistry, Beijing Normal University, Beijing 100875)

【机构】 北京师范大学化学系；

【摘要】 本文对化学增幅抗蚀剂体系的组成及化学增幅作用做了说明。介绍了化学增幅作用中的关键组分-光产酸源和酸增殖剂的发展概况。并对重氮盐、鎓盐、有机多卤化物、磺酸酯类化合物等产酸源的产酸机理、适用光源分别进行了阐述。从目前国际发展的趋势来看,硫鎓盐和磺酸酯类的光产酸源占据主要地位,有机多卤化物中的二嗪化合物还有少量应用。嚬哪醇单磺酸酯类化合物作为酸增殖剂使用较为普遍。更多还原

【Abstract】 The chemical amplification of resist was explained in this article. In addition the keycomponents of resist systems such as acid generator and acid amplifer were summarized indetail. The mechanism and suitable wavelength of photoacid generators such as diazoniumsalt, onium, sulfonate, organ multi-halide were described respectively. From the view ofinternational developing, onium and sulfonate compounds were the main part of photoacidgenerators. Triazine compounds were used in some degree. Pinacol mono-sulfonatecompounds were employed commonly as acid amplifer.更多还原