【作者】 谢扩军； 曾葆青； 杨中海；

【Author】 XIE Kuo-jun;ZENG Bao-qing;YANG Zhong-hai Institute of High Energy Electronics, University of Electronic science and Technology of China,Chengdu, 610054, China

【机构】 电子科技大学高能电子研究所；

【摘要】 用微波等离子化学气相沉积法(MPCVD)在无氧铜基底上沉积微晶金刚石制作场发射冷阴极阵列(FEA),研究场致发射特性和金刚石与铜基底之间的欧姆接触特性。研究结果表明:在3.45MV/m电场强度下可获得100mA/cm~2的发射电流密度,所发射的电子轰击荧光屏能产生明亮的荧光。通过微晶金刚石在铜基底上的嵌布从而实现了金刚石与铜基底之间的低欧姆接触。更多还原

【Abstract】 The crystallite diamond films were synthesized on copper substrate by microwave plasma chemical vapordeposition technique. The field emission characteristics and the electrical characteristics of contacts between metal anddiamond file have investigated Electron emission tsting indicates low turn-on voltages. Current densities 100mA/cm~2had been obtained for applied fields of 3.45MV/m. The bright light spot had been observed, while emitted electronbombardment fluorescent screen. In this study the crystallite diamond directly depositerd on copper and copper directlyused as a electrode, which can achieve the lower resistance ohmic contacts.更多还原