【作者】 冷永祥； 陈俊英； 杨苹； 孙鸿； 王进； 万国江； 黄楠；

【Author】 LENG Yong-xiang;CHEN Jun-ying;YANG Ping;SUN Hong;WANG Jin;WAN Guo-jiang;HUANG Nan Dept. Materials Engineering, Southwest Jiaotong University Chengdu, 610031, China

【机构】 西南交通大学材料系；

【摘要】 本文采用一种新型的双离子束技术,利用金属原（MEVVA）产生钛离子,同时利用射频放电产生氧离子,在样品台上施加一定的负偏压,从而在Si（100）表面沉积氧化钛薄膜.通过改变真空室中氧气的压力,得到不同成分、结构的氧化钛薄膜.利用X射线衍射技术、X光电子能谱技术等研究了薄膜的结构、成分与机械性能.结果表明,随着氧分压的提高,薄膜的主要组成相由Ti₂O变化为完全由金红石型TiO₂组成.薄膜与基体结合牢固,硬度最高可达19GPa.更多还原

【Abstract】 A novel fabrication technique utilizing dual plasma generated by metal vacuum arc （MEVVA） and radiofrequency（RF） is discussed in this paper. By controlling the density of oxygen plasma through changing oxygen inlet,titanium oxide film with different Ti to O ratios can be fabricated. X-ray photoelectron spectroscopy was to used toresearch the chemical state and the composition of the titanium oxide films. The results showed that natural surface ofthe titanium oxide was fully oxided. X-ray diffraction analysis showed that the main phase of the titanium oxide isrutile type structure when oxygen pressure reach 2.7×10^-2Pa. The Microhardness of the titanium oxide films can reachas high as 19GPa. The adherence of Titanium oxide and substrate is 22mN.更多还原