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俄歇电子谱仪及其对快离子导体的表面研究

Surface Study of the Copper Fast Ionic Conductor with a Modified AES System

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【作者】 潘孝仁朱以华赵海波包于诗

【Author】 X. R. Pan, Y. H. Zhu, H. B. Zhao, Y. S. Bao ((Department of Physics, East China Institute of Chemical Technology, Shanghai)

【机构】 华东理工大学

【摘要】 介绍了一台用于表面分析的俄歇电子能谱仪(AES)系统。用该系统研究了铜快离子导体CuI-Cu2O-MoO3-P2O5在AES的探针电子诱导下铜沉积的规律;并发现在这种样品表面,部分氧在电子轰击过程中被蒸发而减少,总的二次电子发射电流由于铜沉积在样品表面上而随电子轰击时间迅速改变。

【Abstract】 A system of Auger electron spectroscopy (AES) for surface analysis was presented. Using this system the copper deposition law with a probe electron of AES attracting in the copper fast ionic conductors Cul-Cu2O-MoO3-P2O5 was studied. It was found that some of the oxygen on the surface in such a sample decreses during the electron bombardment. The total secondary electron emission current against the time of the electron bombardment changes instantaneously owing to the copper deposition on the sample surface.

  • 【会议录名称】 中国真空学会科技进步奖(1994-2000)得奖人员论文集
  • 【会议时间】2000
  • 【分类号】TH842
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