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TiO2及其多层复合膜的制备和光学性能研究
Study on the Preparation and Optical Properties of TiO2 and Its Multilayer Composite Film
【作者】 李敬;
【导师】 史新伟;
【作者基本信息】 郑州大学 , 仪器仪表工程(专业学位), 2021, 硕士
【摘要】 TiO2以优异的光学透过率、高折射率、高介电常数、化学稳定性、较好的附着力和寿命以及光催化性能等,被应用于环保和建筑等领域。然而TiO2的禁带宽度限制了其光谱响应范围在紫外光区,并且在红外光区的反射率较低,达不到低辐射节能的需求。本文在研究TiO2薄膜及其它单层薄膜光学性能的基础上,设计并用磁控溅射法成功制备了TiN/Ag/Cu2O/TiO2复合膜。采用X射线衍射(XRD)、原子力显微镜(AFM)、紫外-可见-近红外(UV-VIS-NIR)分光光度计、Essential Mac Leod软件和椭圆偏振光谱仪(SE)对薄膜的晶体结构和光学性能进行表征,研究内容具体如下:(1)研究了溅射时间对TiO2薄膜晶体结构和光学性能的影响。结果表明,所制备的TiO2薄膜都为锐钛矿型,随着溅射时间的增大,薄膜的结晶度提高,形成以(101)晶面择优生长的锐钛矿型TiO2薄膜。薄膜的厚度随着溅射时间的增大而变大,计算出在此条件下的平均沉积速率为2.133nm/min。随着溅射时间的增大,对人眼最敏感的550 nm波段的透射率从85.7%下降到70.5%,在近红外光的范围内反射率有所提高,薄膜的禁带宽度也从3.66e V减小到3.53e V,光催化效率从8.5%提高到12.7%。(2)研究了溅射时间对TiN薄膜晶体结构和光学性能的影响。结果表明,随着溅射时间的增大,薄膜的结晶度提高,形成以(200)晶面择优生长的TiN薄膜。SE测试表明,随着溅射时间的增大,薄膜的厚度越来越大,从而计算出在此条件下的平均沉积速率为7.650nm/min。随着溅射时间的增大,550 nm波段的透射率从68.3%下降到18.7%,在近红外光的范围内具有较高的反射率并随溅射时间增大而增大。红外发射率分别为0.494(=2.5μm)和0.156(=25μm),表现出较好的低辐射性能。(3)通过控制溅射时间来研究Ag薄膜和Cu2O薄膜的晶体结构和光学性能。结果表明,随着溅射时间的增加,薄膜的结晶度提高,厚度增大,可见光区的透射率有所下降,近红外光区的反射率有所上升,并且计算了Ag薄膜和Cu2O薄膜的沉积速率分别为17.278nm/min和0.749nm/min。(4)在此基础上,成功制备了TiN/Ag/Cu2O/TiO2复合膜,主要研究了其光学性能,重点分析了复合膜的光催化机理。分析表明,光学综合性能最优的复合膜在人眼最敏感的550nm处的透射率达到了66.6%,近红外区域的反射率约为50%;复合膜中Cu2O与TiO2之间形成p-N异质结,对比TiO2薄膜的禁带宽度显著减小,将TiO2薄膜的光谱响应范围由紫外光区扩大到可见光区,光催化效率显著提高,同时TiN和Ag提供一定的选择透过和低辐射性能,说明通过设计多层复合薄膜来改善TiO2薄膜的光学性能是有前景的。
【Abstract】 TiO2 has been used in the fields of environmental protection and construction due to its excellent optical transmittance,high refractive index,high dielectric constant,chemical stability,good adhesion and life and photocatalytic performance.However,the band gap width of TiO2 limits its spectral response range in the ultraviolet region,and its reflectivity in the infrared region is low,which cannot meet the requirements of low radiation energy saving.In this paper,TiN/Ag/Cu2O/TiO2 composite films were designed and successfully prepared by magnetron sputtering method on the basis of studying the optical properties of TiO2 films and other monolayer films.X-ray diffraction(XRD),atomic force microscopy(AFM),UV-VIS-NIR spectrophotometer,Essential Macleod software and spectroscopic ellipsometry(SE)were used to characterize the crystal structure and optical properties of the films.The research contents are as follows:(1)The effect of sputtering time on the crystal structure and optical properties of TiO2 thin films were studied.The results show that the prepared TiO2 films are all anatase type.With the increase of sputtering time,the crystallinity of the films becomes more and more perfect,forming anatase type TiO2 films with(101)crystal plane selective growth.The thickness of the films increases with the increase of sputtering time,and the average deposition rate is calculated to be 2.133nm/min.With the increase of sputtering time,the transmittance of the 550 nm band which is the most sensitive to human eye decreases from 85.7%to 70.5%,the reflectivity in the near infrared light range increases,the band gap of the film also decreases from 3.66e V to 3.53e V,and the photocatalytic efficiency increases from 8.5%to 12.7%.(2)The crystal structure and photoelectric properties of TiN thin films were studied.The results show that with the increase of sputtering time,the crystallinity of the films becomes more and more perfect,forming the TiN films with(200)crystal plane.The SE test showed that the thickness of the film increased with the increase of sputtering time,and the average deposition rate under this condition was calculated to be 7.650nm/min.With the increase of sputtering time,the transmittance of 550 nm band decreases from 68.3%to 18.7%.The infrared emissivity of the film is 0.494(λ=2.5μm)and 0.156(λ=25μm),respectively,which shows the better low radiation properties.(3)The crystal structure and optical properties of Ag and Cu2O films were studied by controlling the sputtering time.The results show that with the increase of sputtering time,the crystallinity and thickness of the films increase,the transmittance of the visible light region decreases,and the reflectance of the near infrared region increases.The deposition rates of Ag and Cu2O films were calculated as 17.278nm/min and0.749nm/min,respectively.(4)On this basis,TiN/Ag/Cu2O/TiO2 composite film was successfully prepared.The optical properties of the composite film were mainly studied,and the photocatalytic mechanism of the composite film was mainly analyzed.The results show that the transmittance and reflectivity of the composite film with the best comprehensive optical properties at 550nm,the most sensitive region for human eyes,are 66.6%,and the reflectivity in the near-infrared region is about 50%.Cu2O composite membrane with p-N formed between TiO2 heterojunction,greatly reduce the band gap contrast TiO2 thin film,the spectral response of the TiO2 film range by ultraviolet area expanded to visible light area,photocatalytic efficiency improved significantly,at the same time TiN and Ag provide a certain selection of transmission and low radiation performance,that by designing multilayer composite thin films to improve the optical properties of TiO2 thin film is promising.
【Key words】 Magnetron sputtering; Ti N/Ag/Cu2O/TiO2 composite film; Sputtering time; Low radiation; Photocatalytic;