【作者】 徐爱娇；

【导师】 黄佳木；

【作者基本信息】 重庆大学 ， 材料学， 2007， 硕士

【摘要】 WO₃电致变色薄膜因具有着色效率高、可逆性好、响应时间短、寿命长、成本低等优点,使其在许多领域有着广阔的应用前景,因此引起了科技界的高度重视,在世界范围内的研究异常活跃,被认为是最有发展前途的电致变色材料之一。但是目前它离实际大规模应用还有一定的距离,使其真正进入实际应用是当前众多研究者努力的方向。通过多种途径可以提高WO₃薄膜的电致变色性能,优化制备工艺参数和对薄膜进行掺杂是其中两种有效的方法。到目前为止,制备电致变色薄膜最常用的方法有溶胶-凝胶法、真空蒸发法、化学气相沉积法和溅射沉积法等,其中磁控溅射以沉积速率高、基片温升低、膜层均匀性及附着力好、工艺参数易控制等优点而日益成为制备电致变色薄膜尤其是WO₃薄膜最理想的工艺方法。但是目前用磁控溅射方法制备WO₃薄膜的报道相对较少,对该方法制备的薄膜的性能研究也很少见。本课题研究采用磁控反应溅射工艺,以纯钨和纯镍（钛、钒）为靶材在ITO玻璃上制备Ni（Ti、V）掺杂WO_x电致变色薄膜,通过紫外-可见分光光度计和X射线衍射仪及XPS分析,研究了制备工艺参数对WO_x薄膜电致变色性能和结构的影响,并论述了掺杂对薄膜电致变色性能的影响机理。研究表明:用反应磁控溅射制备的WO_x薄膜为非晶态,表现出良好的电致变色性能;而WO_x薄膜掺杂之后,非晶态的趋势强于未掺杂的WO_x薄膜,结构的变化导致了WO_x薄膜具有更好的电致变色性能;掺杂工艺对WO_x薄膜的电致变色性能影响较为复杂,主要与掺杂方式和相对掺杂量两方面有关,当相对掺杂量处于有效掺杂范围和最佳值附近,掺杂越均匀,将在很大程度上提高WO_x薄膜的电致变色性能,非均匀掺杂的薄膜由于界面势垒的存在,电致变色性能要逊于均匀掺杂的薄膜,甚至是未掺杂的WO_x薄膜。对于不同的掺杂物,对提高WO_x薄膜电致变色性能的贡献各不相同:Ni、V的掺杂可以提高记忆存储能力,Ti的掺杂可以延长循环寿命。更多还原

【Abstract】 Owing to the special performance of continuous and reverse photoelectric property which can be manually controlled, electrochromic film materials, which are paid attention to by the science and technology world, and studied actively, have been widely applied in many fields, especially in the electrochromic devices. Among many electrochromic materials, WO₃ is regarded as one of the most potential materials because of its high coloration efficiency, strong reversibility, short transmission response time, long cycle life and lower cost. It is a pity that they are far from practical use, and it is important work that the material is put into practice. There are some ways to improve the films’electrochromic performances, for instance, optimizing process parameters and doping method are two effective ways.With pure tungsten and nickel（titanium、vanadium） targets, WO_x and WO_x:Ni（WO_x:Ti、WO_x:V）films were deposited on ITO glass substrates by reactive magnetron sputtering and they were analyzed using spectrophotometer, XRD and XPS. The effect of the process parameters and doping parameters on the electrochromic performances and the structure of WO_x films were discussed.Also the influence mech- anism of doping on WO_x films’electrochromic performances and structure were discussed with the help of the study results by other researchers.The research results show that the WO_x films deposited by the reactive magnetron sputtering were amorphous; in electrochromic reaction their optical properties and structure would change and they behaved good electrochromic performances. The amorphism of Ni（Ti、V）-doping WO_x films, which have better electrochromic properties, tends to be stronger. It is rather complex to the effect of doping on electrochromic of WO_x films, which is related to the doping mode and relative doping quantity. Even doping is helpful to greatly improve the electrochromic properties when the relative doping quantity is in the range of effective doping and around optimized value. The contributions to the improvement of WO_x films of different dopants were different:Ni-doping and V-doping would improve the ability of color storage while Ti-doping would improve the cycle life.更多还原