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无支撑铝膜及金钆多层薄膜的制备及性能研究
The Preparation and Properties of Unsupported Al Films and Au/Gd Multilayer Films
【作者】 侯爱国;
【作者基本信息】 重庆大学 , 材料物理化学, 2006, 硕士
【摘要】 在惯性约束聚变核物理(ICF)实验中,Al平面薄膜靶和金属多层薄膜是常用的靶型,实验要求Al平面薄膜靶具有良好的加工性能,但是由于微加工的困难,如何制备表面平整和内应力小的Al平面薄膜靶一直是制靶工作者探索的方向。近年来,随着软X射线多层膜研究的进展,金属多层薄膜在ICF物理实验中应用越来越广泛,特别是Au/Gd多层薄膜具有比单纯的Au膜更高的X射线转换率,在ICF物理实验领域极具应用前景。本文探索采用不同脱膜剂制备表面光洁度高、内应力小的无支撑Al膜,并着重探索采用计算机控制的多靶头磁控溅射设备制备界面清晰、层间厚度控制准确的金钆多层薄膜。通过真空蒸发的方法获得了无支撑Al膜,用X射线衍射(XRD)方法,研究了无支撑Al膜的内应力,分析了不同脱膜剂对无支撑Al膜内应力的影响。并用AFM来表征薄膜的表面形貌。结果表明:(1)不同脱膜剂对无支撑Al膜的内应力有很大的影响。在相同工艺条件下,选用聚苯乙烯磺酸钠和聚乙烯醇作脱膜剂得到的铝膜膜层致密、均匀、大晶粒少,残余内应力均比在载波片上制备的铝膜小。(2)相同工艺条件下,选用聚乙烯醇作脱膜剂得到的铝膜的表面粗糙度要好于在聚苯乙烯磺酸钠上得到的铝膜,但后者得到的铝膜的残余内应力小于前者。采用直流磁控溅射法制备了Au/Gd多层薄膜,并分析了薄膜的结构性能及制备条件的影响。结果如下:(1)不同周期厚度的Au/Gd多层薄膜,界面明锐程度和表面粗糙度不同。随着Au/Gd多层薄膜周期厚度的增加,界面变得清晰,但表面粗糙度变差。(2)溅射气压、溅射功率对Au/Gd多层薄膜的界面状况、晶相结构及界面宽度有很大影响,随着溅射气压和溅射功率的增加,多层薄膜的界面状况不断优化,沉积速率不断增加,调制周期逐渐增加。(3)由于晶格不匹配,磁控溅射制备的Au/Gd多层薄膜层与层之间存在很多缺陷,Au和Gd的晶粒在制备过程中没有完全长大,导致在再结晶过程中,电阻随温度的升高而减小,再结晶过程结束后,电阻趋于稳定。
【Abstract】 In the inertial control fusion ( ICF) physics experiment, the Al film and metal multilayer films are in common use types of target. The good fabrication property of Al film is required. The Al film has much extensive usage, but how to prepare the Al film with the small surface roughness and inner stress is the researcher’s goal. In recent years, along with the progress of the soft X-ray multilayer films research, multilayer films are applied more and more extensive in the ICF physics experiment, especially Au/ Gd multilayer films which have the higher X-ray transforming rate than Au film, have been applied widely in ICF physics experiments.In this article, we prepared supportless Al films on different disjointedness, and investigated how to prepare the Au/ Gd multilayer films with sharp interface by DC magnetron sputtering.We deposited the supportless Al-films by vacuum evaporation, and analyzed the condition of stress on different disjointedness with X-ray diffraction (XRD) and the roughness with atom force microscope (AFM). The investigation indicated that the inner stress and the roughness were different on different disjointedness.The results show that: (1) The disjointedness has great influence on the stress. In sameness technical conditions, the inner stress of films on Sodium Vinylsulfonate Polymerization and on Polyvinyl Alcohol are lower than it on glass. (2) In sameness technical conditions, the surface roughness of film on Polyvinyl Alcohol is better than on Sodium Vinylsulfonate Polymerization, but the stress of film on Sodium Vinylsulfonate Polymerization is lower than it on Polyvinyl Alcohol.We deposited the Au/ Gd multilayer films by DC magnetron sputtering, and analyzed the structure of films and the influence of the preparation condition.The results show that: (1) The interface and the surface roughness with different period thickness are different. With the increasing of thickness, the interface became acuity, but the surface roughness became coarseness. (2) The sputtering pressure and the sputtering efficiency have important effect to the interface and the crystal structure. With the increasing of them, the interface became acuity, the deposition speed and the crystal thickness increased. (3) Because the crystal lattice didn’t match, there are many defects in Au/ Gd multilayer, the Au and Gd crystalline grain did not grow up completely in the process, the electric resistance goes up with the temperature. When
- 【网络出版投稿人】 重庆大学 【网络出版年期】2007年 01期
- 【分类号】TB383.2
- 【下载频次】159