MEMS工艺集成化设计与仿真技术研究

【作者】 徐景辉；

【导师】 苑伟政；

【作者基本信息】 西北工业大学 ， 机械制造及其自动化， 2006， 硕士

【摘要】 随着MEMS的迅速发展,MEMS器件越来越复杂,MEMS的制作技术也随之发展:而另一方面,MEMS的设计技术显得相对落后,作为MEMS CAD重要研究内容之一的工艺级集成化设计对于提高MEMS的设计水平具有非常重要的意义。 本文以MEMS工艺集成化设计方法与单晶硅各向异性腐蚀模拟为研究对象,结合国家863/MEMS重大专项“MEMS设计工具集成及应用”,提出了MEMS工艺集成化设计方法与流程,并对MEMS的关键加工工艺——单晶硅各向异性腐蚀进行建模与模拟。 首先,根据MEMS工艺集成化设计的概念,详细分析了工艺集成化设计的体系结构,并在此基础上提出了基于版图和三维实体的工艺集成化设计流程。 其次,以单晶硅各向异性腐蚀为例,分析了单晶硅的微观结构及各向异性腐蚀机理,并在Seidel提出的电化学腐蚀模型的基础上,建立了基于动态CA算法各向异性腐蚀模拟模型,采用VC++编程语言和OpenGL图形库实现了对简单掩膜图形的各向异性腐蚀模拟。 再次,结合典型MEMS器件——Z轴微机械陀螺的设计,分别验证了基于版图和基于三维实体的MEMS工艺集成化设计流程。 最后,对本论文工作进行了总结,并初步探讨了MEMS工艺集成化设计的发展方向。更多还原

【Abstract】 As fast development in MEMS field, the MEMS devices are more and more complex, and the manufacturing technology for MEMS is developed rapidly, too. On the other hand, the design technology for MEMS is relative laggard. As one of important content for MEMS CAD, the process integrated design is very important for improving the MEMS design level.In this paper, the methodology for the process integrated design and the crystalline silicon anisotropic wet etching simulation were studied at the support of country 863/MEMS fatal special project "MEMS design tools integration and application". The process integrated design methodology and flow for MEMS design was put forward. Besides, the model of the crystalline anisotropic wet etching was established and the simulation program was developed.Firstly, according to the conception MEMS process integrated design, the systemic frame of the process integrated design is analyzed in detail. The methodology of process integrated design based the mask layout and the 3D solid model was put forward.Secondly, taking the crystalline silicon anisotropic wet etching for example, the anisotropic wet etching model based dynamic cellular automata algorithm and the Seidel’s electrochemistry etching model was established after analyzing the micro-structure of the crystalline silicon and the principle of anisotropic wet etching. The simulation program based VC++ language and OpenGL graphics library was developed, and the program can simulate the anisotropic wet etching of the rectangle layout.Thirdly, the design flow based the mask layout and the 3D solid model were respectively validated on the basis of the design of typical MEMS device —Z axis micro machining gyroscope.Finally, the total paper was summarized, and the development direction of MEMS process integrated design was simply discussed.更多还原