离子束辅助真空电弧沉积纳米ZrN及（Zr，Me）N薄膜的研究

【作者】 刘丽红；

【导师】 胡社军；

【作者基本信息】 广东工业大学 ， 材料加工工程， 2004， 硕士

【摘要】 根据真空电弧沉积的膜层与基材的附着力强、沉积速度快、沉积温度低、无公害等优点和离子束辅助沉积的离子束轰击可以获得致密的优质薄膜材料，而国内离子束辅助真空电弧沉积ZrN系纳米超硬薄膜研究尚属空白，本论文进行了离子束辅助真空电弧沉积ZrN系纳米超硬薄膜研究；用扫描电镜和能谱分析仪观测试样的形貌及成分（SEM／EDS）；膜层的组织结构用X射线衍射仪进行测试分析（XRD）；用超微负荷显微硬度计测量膜层的显微硬度；膜基结合力采用划痕仪进行测试；用表面性能测试仪测试膜层的耐磨性；采用滤纸法对膜层的孔隙率进行检测。 离子束辅助真空电弧沉积ZrN系薄膜技术稳定可靠，在优化工艺条件下能保证薄膜具有良好的沉积工艺稳定性和综合性能： （1）真空度对真空电弧沉积ZrN薄膜结构的择优取向有影响，偏压对真空电弧沉积ZrN薄膜的结构形态有影响，较高真空度和较低的偏压的工艺组合或者较低真空度和较高偏压的工艺组合沉积的ZrN薄膜就有较好的显微硬度和结合力配合； （2）离子束辅助对真空电弧沉积ZrN薄膜组织和性能具有显著的影响。随离子束束流和加速电压的增加，晶粒尺寸细化，显微硬度提高，耐磨性和结合力得到改善。当离子束流为150mA、加速电压为3500V时，膜层平均晶粒尺寸是9.22nm，显微硬度可达到4142.6 HV_0.025，膜层的综合性能可达到最佳状态；当离子束束流和加速电压继续增大时，薄膜的综合性能有所下降。 （3）沉积温度的降低有利于真空电弧沉积ZrN薄膜晶粒尺寸的细化，膜层致密； （4）在离子束辅助真空电弧沉积（Zr,Me）N多元膜中，Ti、Cr、W和AL等多组元的复合可以显著细化（Zr，Me）N薄膜的晶粒，XRD分析表明ZrN（111）存在着明显的宽化效应。多元膜的性能测试表明，复合薄膜具有很高的硬度和耐磨性，结合力也较好。其中，在离子束流为150mA、加速电压为3500V的沉积条件下（Zr,Ti）N多元薄膜的显微硬度达4002 HV_0.025，临界载荷Lc=44N。 离子束辅助真空电弧沉积ZrN系薄膜技术对于提高工具、模具和其它耐磨零广东工业大学工学硕士学位论文件的表面硬度、耐磨性和耐用度有显著的作用，在金属切削领域具有十分广阔的应用前景。更多还原

【Abstract】 It is known that Vacuum Arc Depositing has a high ability to be used as strong adhesion, rapid depositing speed, low depositing temperature and non-social effects of pollution and Ion Beam Assisted Depositing can gain compact and high quality films. Up to now, however, there is still lack of the research on superhard nano-films by IBAVAD at home, therefore it is investigated in detail that the research on superhard nano-films by IBAVAD in this paper; The surface morphology of the films were observed by Scan Electron Microscope( (SEM/EDS ) ); The phase structure of the films was determined by X-ray Diffiation(XRD); The micro-hardness of the films was tested by micro - hardness testing machine with ultra-loading; The adhesion was tested by nick-testing machine; The wear resistance was tested by surface property-testing machine; The hole ratio was tested by filter paper means. The experimental results showed that:The technical characteristic of Bulat-6 Vacuum Arc Depositing machine in depositing superhard nano-films is stable. The outstanding whole synthetical properties of films and the depositing stability are controllable with the optimized technical condition.(1) Vacuum degree and bias voltage have important influences on the microstructure and properties of ZrN films. Vacuum degree influences the preferred texture-orientation of ZrN films and bias voltage influences the microstructure of ZrN films. Its have better microhardness and adhesion that the ZrN films are deposited according to the combination of higher vacuum degree and lower bias voltage or the combination of lower vacuum degree and higher bias voltage;(2) IBAD have a stimulative function to microstructure and properties of ZrN films. Following the increase of ion beam and accelerative voltage, grain size is fined and microhardness is improved and wear resistance and adhesion gain melioration between 80 and 200 mA of ion beam and between 1500V and 4000V of accelerative voltage. The average grain size is 9.22 nm and the microhardness can reach 4142.6 HV0.025 and the best wholesynthetical properties of films can be gained when the ion beam is 150 mA and the accelerative voltage is 3500 V.(3) The fall of depositing temperature advantages the grain size to be fined and the compactness of ZrN film;(4) the multi-complex of Ti, Cr, W, AL et al can evidently fine the grain size of (Zr,Me)N films by IBAVAD. The XRD spectrum shows that ZrN (111) phase have remarkable broaden phenomenon. The properties-testing of multi-elements films show that multi-complex films have higher microhardness and wear resistance and have better adhesion. The microhardness can reach 4002 HV0.025 and the critical loading Lc is 44 N when the ion beam is 150 mA and accelerative voltage is 3500 V.The technique of IBAVAD ZrN system films have prominent effect on improvement of surface hardness and wear resistance and durability of tool and mold and other wearable part. It have widest application foreground on the field of metal cutting.更多还原