【作者】 彭钦军；

【导师】 郭永康；

【作者基本信息】 四川大学 ， 光学， 2003， 硕士

【摘要】 信息时代对器件的微型化、轻量化、集成化的迫切需求，极大地推动了微细加工技术的发展，以微光学、微电子、微机械为基础的MEMS和MOEMS技术已在航空航天、光纤通信、光互联、光计算等高科技诸多领域展现出十分广阔的应用前景，将对本世纪的军事、工业生产、以及人们的生活产生深远影响。源于VLSI的平面光刻工艺用于制作微光学、MEMS、MOEMS器件的三维连续面型受到很大的局限。本文研究一种制作任意三维连续微结构的实时掩膜光刻技术。结合投影光刻系统的并行性和可编程数字化液晶显示器件的灵活性提出并建立了液晶显示实时掩膜光刻系统；提出了基于等高面和基于灰度量化的两种实时掩膜产生方法，编制了相应的计算软件；根据实时掩膜的特点，提出从三个方面对掩膜进行精细校正的方法，包括图形边缘灰度处理对掩膜图形的边缘优化，预畸变掩膜图形对空间像传递的非线性校正，调节每幅图形的曝光时间对曝光，显影和刻蚀的非线性校正，并且讨论了象素栅格对制作结果的影响；提出并研究了生化酶化学湿法刻蚀卤化银明胶形成连续深浮雕的新技术；最后基于部分相干光成像理论进行了模拟以及应用实时掩膜和酶蚀技术研制成功微透镜阵列，微柱透镜阵列，微轴锥镜阵列，锯齿形光栅等多种微光学器件。本项技术具有不受限于任意三维面型结构，不需要常规掩膜，从而不存在对位误差，并可对掩膜图形实时修改和不需要昂贵设备以及制作周期短等优点，为产生任意三维连续微结构提供了一条有效的新途径，对发展微光学、MOEMS有重要意义。更多还原

【Abstract】 The great demands for the micro-devices with micromation, lightweight and integration have vastly prompted the development of the micro fabrication technologies in information era. The MEMS and MOEMS techniques of the rapid development based on micro optics, microelectronics and micro mechanics have indicated an expansive future, which are applied in the aviation and space flight, optical communication, optical interconnected network, optical computing and other many high technique fields, and will also have a far-reaching impact on the military science and technologies, industry and the living of the people which we confront in the current century. The conventional photolithographic technology from VLSI technique exists in large limitations for the fabrication of micro optical, MEMS and MOEMS elements with three-dimension (3D) continuous structure. In this thesis, the research on the real-time photolithography technique for the fabrication of 3-D arbitrarily shaped microstructures has been carried out. Combined the advantages of programmable digital LCD system and projection photolithography system, which makes use of the flexibility of the former and the parallelism of the latter, the system of LCD real-time photolithography is proposed and set up through the sufficient investigation. Two methods based on the contour plane and the descritized gray scales for real-time mask are proposed and the relevant software for the techniques is developed. According to the characteristics of real-time masks, the optimal designs and fine corrections for the mask patterns have been developed on three aspects, including the processing of edges of mask patterns with the calculated gray level, the nonlinear correction of aerial image with the pre-distorted mask patterns, the nonlinear correction for post-processing through adjusting the display time of each mask pattern. The impacts of the LCD pixel structure on the fabricated result also are discussed. The new technique for the shape of deep relief structure through etching SHSG withenzyme is proposed and developed. At last, the simulations have been made based on the partial coherent imaging theory, and the micro-optical elements such as the micro lens, micro-cylindrical lens array, micro axicon array and so on have been achieved on SHSG through the applications of real-time mask and enzyme etching technique.Through the development of this technique, the conventional photolithography is greatly simplified as a single LCD mask can replace a set of conventional masks. Alignment between different levels of masks in conventional photolithography is no longer necessary if the LCD mask is used. Because the mask design can be adjusted in real time, it is comparatively easy to change the mask design to compensate any nonlinear effects in aerial imaging, in photo resist exposure, development and substrate etching processes. Thus it gives a new and effective approach for the fabrication of the arbitrarily shaped microstructure with 3-D continuous relief, and has very important significance to the development of micro optics and MOEMS.更多还原