【摘要】 为提升钼钛合金溅射靶材的综合性能及其薄膜质量，系统研究钛粉粒径对靶材微观结构演变与薄膜性能的影响规律。选用粗、细两种不同粒径的钛粉分别与钼粉组合，经冷等静压成型与热等静压烧结的工艺制备靶材；采用XRD、SEM/EBSD表征靶材相组成、晶粒分布及致密度，通过AFM、四探针技术测试溅射薄膜表面粗糙度与电阻率。结果表明：细钛粉靶材的密度更高（7.381 g/cm³）、MoTi合金相比例也更高（63.2%）,溅射的薄膜表面更平整、厚度更均匀；粗钛粉靶材薄膜的电阻率更小(9.7×10^-4Ω·cm)。细粒径钛粉有利于混合均匀促进原子扩散，显著提升靶材成分均匀性及薄膜表面质量；采用细粒径钛粉与钼粉搭配的配粉工艺，虽其薄膜电阻率微增，但综合致密度、显微组织均匀性等核心指标，其更符合高性能溅射靶材要求。更多还原

【Abstract】 To enhance the comprehensive performance of Mo-Ti alloy sputtering targets and the quality of the deposited films, a systematic study was conducted to investigate the effects of titanium powder particle size on the microstructural evolution of the Mo-Ti targets and the performance of the resulting films.Coarse and fine titanium powders were mixed separately with molybdenum powder, and the mixtures were fabricated into Mo-Ti targets through cold isostatic pressing（CIP） and hot isostatic pressing（HIP）.XRD, SEM/EBSD were employed to characterize the phase composition, grain distribution, and density of the targets, while AFM and four-point probe techniques were used to measure the surface roughness and resistivity of the sputtered films.The results show that the finer titanium powder target exhibits a higher density（7.381 g/cm³） and a higher Mo-Ti alloy phase ratio（63.2%）.The films sputtered from the finer titanium powder target display a smoother surface and more uniform thickness.Although the films resistivity is slightly higher(9.7×10^-4 Ω·cm), the finer titanium powder promotes homogeneous mixing and enhances atomic diffusion, significantly improving the compositional homogeneity of the targets and the surface quality of the films.Considering the comprehensive performance, including density, microstructural uniformity, and films quality, the finer titanium powder combined with molybdenum powder meets the requirements of high-performance sputtering targets better than the coarser titanium powder.更多还原