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融合CFDP和CPM分析的关键核心技术识别及其路径分析——以芯片光刻领域为例
Identification and Path Analysis of Key Core Technologies Integrated CFDP and CPM Analysis: A Case Study of Chip Lithography
【摘要】 [目的/意义]构建创新、多层次的关键核心技术研究体系有助于把握技术发展的先手优势,抓住技术突破的重要时机。[方法/过程]基于Word2Vec模型进行文本向量化,通过CFDP算法确定核心技术,利用结构洞分析识别关键核心技术,并构建专利引文网络,运用关键路径法(Critical Path Method,CPM)探究技术发展的重要路径,提出一种关键核心技术研究方法体系。[结果/结论 ]以芯片光刻领域为例,验证该方法体系在关键核心技术识别及其路径分析方面的可行性。通过现有国家政策的查阅验证,实证结果具有合理性,该方法体系的实用性与有效性得到进一步验证。
【Abstract】 [Purpose/Significance] Constructing an innovative and multi-layered key core technology research system helps seize the initiative in technological development and grasp crucial opportunities for technological breakthroughs. [Method/Process] This paper adopted the Word2Vec model for text vectorization and utilized the CFDP algorithm to identify core technologies. It employed structural hole analysis to recognize key core technologies and constructed a patent citation network. The Critical Path Method(CPM) was applied to explore the significant pathways of technological development, presenting a systematic method for key core technology research.[Result/Conclusion] Using chip lithography as a case study, this paper validates the feasibility of the proposed method system in the identification and path analysis of key core technologies. Through the examination of existing national policies, the empirical results are found to be reasonable, further confirming the practicality and effectiveness of the method system.
【Key words】 key core technology; technology identification; technology path analysis; semantic mining; citation network;
- 【文献出处】 图书情报工作 ,Library and Information Service , 编辑部邮箱 ,2024年16期
- 【分类号】F426.63;G353.1
- 【下载频次】96