【摘要】 在紫外照射下,对氧氟沙星(OFLX)在蒙脱石(KSF)悬浮液中的去除效率进行研究,探讨了KSF的投加量、H2O2的投加量、溶液p H值对OFLX去除率的影响以及去除机制.实验结果表明:UV/KSF/H2O2体系可以有效地去除OFLX.KSF的投加量和H2O2的投加量有最优值.当KSF投加量为0.1 g/L,H2O2投加量为32 m L/L,p H为7.0时,OFLX去除率最大为93.4%.溶液p H值在3.0~7.0范围内,OFLX去除率较高,均在85%之上,当p H值继续增加,去除率则下降.动力学分析表明,OFLX在UV/KSF/H2O2体系中的去除可用二级反应动力学来描述.通过添加OH·猝灭剂异丙醇到UV/KSF/H2O2体系内,明确了OFLX的两种去除途径:OH·的氧化去除和KSF吸附去除.更多还原

【Abstract】 The removal of oflxacin in montmorillonite(KSF) suspension under UV irradiation was studied. Effects of the dose of KSF and H2 O2, solution p H and the removal mechanism were investigated. Results showed that oflxacin could be efficiently removed by UV/KSF/H2 O2. Both KSF and H2 O2 had the optimum dose. When the amount of KSF and H2 O2 was 0.1 g/L and 32 m L/L, the removal rate could reach the maximum 93.4%with solution p H=7.0. When solution p H was in the range of 3.0 ~7.0, the removal rate was relatively higher than 85%. However, the increasing solution p H prohibited the removal rate. The removal of oflxacin by UV/KSF/H2 O2 followed pseudo-second dynamics. Isopropanol was added as OH·quenching agent to investigate the removal mechanism and results showed that OFLX was removed by two ways-being degraded by OH· and being adsorbed by KSF.更多还原