【摘要】 以微弧氧化电压和氧化时间为变化参量,考察了不同工艺参数下TC4合金表面涂层的厚度、表面粗糙度、孔隙率和平均孔径的变化规律,得到了TC4钛合金适宜的微弧氧化工艺,并探讨了表面涂层的沉积长大机理。结果表明,TC4钛合金涂层厚度在电压为450 V时达到最大值36.2μm,而表面粗糙度在电压为500 V时取得最大值3.3μm。涂层表面的孔隙率和平均孔径随着电压的增加而呈现逐渐增加的趋势。随着微弧氧化时间的增加,钛合金表面涂层厚度和表面粗糙度都呈现出逐渐增加的趋势。在微弧氧化前30 min内,钛合金涂层的表面孔隙率的增长速度较快,而当氧化时间超过30 min后,涂层表面孔隙率增长速度变缓,而平均孔径仍然以较快的速度增加。更多还原

【Abstract】 The micro arc oxidation voltage and oxidation time were used as parameters, and the effect of different process parameters on coating thickness, surface roughness, porosity and average pore size of TC4 alloy were studied. The suitable micro arc oxidation process of TC4 titanium alloy was obtained, and the deposition and growth mechanism of surface coating was discussed. The results show that the maximum thickness of TC4 titanium alloy coating is 36.2 μm when the voltage is 450 V, and the maximum value of surface roughness is 3.3 μm when the voltage is 500 V. The coating porosity and average pore size increase with the increasing of the voltage gradually; with the increasing of oxidation time, the coating thickness and roughness of titanium alloy show a gradually increasing trend. In the first 30 min during micro arc oxidation, the surface porosity of titanium alloy coating increases rapidly, but in the later 30 min during micro arc oxidation, the porosity increases slowly and the average pore size still increases at a faster rate.更多还原