【摘要】 通过磁控溅射离子镀与中频脉冲偏压电源相结合,优化制备(Al,Ti)N涂层的工艺。利用HVS-1000数显显微硬度计检测涂层硬度;MET-400多功能材料表面试验仪测定膜基结合力,JS-QHY-2型球痕仪测定厚度,DX-1000型X射线衍射仪检测物相。采用正交实验,作算术平均值和极差分析,优化制备涂层的工艺。结果表明波动时,最佳工艺为功率为10:24,脉冲偏压为100V,时间为2.5h,不波动时最佳工艺为5:24,脉冲偏压为100V,时间为2.5h。更多还原

【Abstract】 The preparation of(Ti, Al) N coating was optimized by magnetron sputtering ion plating combined with medium frequency magnetron sputtering power supply. The hardness of the coating was measured by HVS-1000 digital micro hardness tester, and the thickness was measured using the JS-QHY-2 ball mark. Orthogonal experiments were used to optimize the preparation process of the coating by arithmetic mean and range analysis. The results show that the magnitude of the influencing factors the best process power is10:24, the pulse bias is 100 V, the time is 2.5 h, and the influencing factor is the best process is 5:24, the pulse bias is 100 V, the time is 2.5 h.更多还原