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氧含量对磁控溅射Nb掺杂TiO2薄膜结构与性能的影响
Influence of Oxygen Concentration on Properties of Magnetron Sputtered Nb-Doped TiO2 Coatings
【摘要】 采用三靶磁控共溅射法在玻璃衬底上制备了Nb掺杂TiO2透明导电薄膜。研究了在不同氧含量时薄膜的结构和光电性能。实验结果表明:氧含量的变化能改变Nb掺杂TiO2薄膜晶体的晶粒尺寸、表面形貌、透光率和电阻率,当溅射氩气中通入2%氧气时,可得到性能最佳的锐钛矿相Nb掺杂TiO2薄膜,所得薄膜可见光透过率高达80%,电阻率降至2.5×10-3Ωcm。并且,Nb掺杂导致了TiO2薄膜的吸收限产生蓝移,且蓝移程度随氧含量的改变而有所不同。研究认为,氧含量改变了Nb掺杂TiO2薄膜晶体的结构形貌以及Nb杂质和氧空位提供的有效载流子浓度,从而直接影响了Nb掺杂TiO2薄膜的光电性能。
【Abstract】 The Nb-doped TiO2 coatings were synthesized by triple-target magnetron co-sputtering. The impact of the O2 concentration mixed in argon environment and Nb-doping on the microstructures and properties of the Nbdoped TiO2 coatings was investigated with X-ray diffraction,atomic force microscopy and ultra violet visible spectroscopy. The results show that the Nb-doping and O2 concentration significantly affected the electronic structures and properties of the TiO2 coatings. For example,as the O2 concentration increased in 0% 6% range,the surface roughness and size of anatase-phased grain increased,the visible-light transmittance changed in an increase-constant mode,accompanied by a decrease-increase change in resistivity. Deposited at O2-2%,the transmittance and resistivity were 80% and 2. 5 × 10-3Ω·cm,respectively. Depending on the O2 concentration,Nb-doping resulted in a blue-shift of absorption edge,possibly because of the effective carrier concentration induced by a combination of Nbimpurity and O-vacancy.
【Key words】 Magnetron sputtering; Oxygen content; NTO thin film; Structure; Photoelectric property;
- 【文献出处】 真空科学与技术学报 ,Chinese Journal of Vacuum Science and Technology , 编辑部邮箱 ,2017年03期
- 【分类号】TQ134.11;TB383.2
- 【被引频次】4
- 【下载频次】126