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Effects of Si surficial structure on transport properties of La2/3Sr1/3MnO3 films

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【作者】 顾晓敏王伟周国泰高凯歌蔡宏灵张凤鸣吴小山

【Author】 Xiao-Min Gu;Wei Wang;Guo-Tai Zhou;Kai-Ge Gao;Hong-Ling Cai;Feng-Ming Zhang;Xiao-Shan Wu;Collaborative Innovation Center of Advanced Microstructures, Laboratory of Solid State Microstructures, Photovoltaic Engineering Center,School of Physics, Nanjing University;Collaborative Innovation Center of Advanced Microstructures, Laboratory of Solid State Microstructures,School of Electronic Science and Engineering, Nanjing University;

【机构】 Collaborative Innovation Center of Advanced Microstructures, Laboratory of Solid State Microstructures, Photovoltaic Engineering Center,School of Physics, Nanjing UniversityCollaborative Innovation Center of Advanced Microstructures, Laboratory of Solid State Microstructures,School of Electronic Science and Engineering, Nanjing University

【摘要】 La2/3Sr1/3MnO3 films are deposited on(001) silicon substrates,in which the silicon surfaces have artificially been treated into the scallops-like,pyramid-like,and smooth polishing structure,by pulsed laser deposition.The magnetoresistances of the films on etched substrates under low applied field are very sensitive to the applied field,and much larger(14.3% for acid-etched,and 42.9% for alkali-etched) than that on the polished Si at 5 K.Zero-field-cooled and field-cooled magnetization behaviors are measured and analyzed.Remarkable upturn behaviors in temperature-dependent resistivity for all samples are observed at low temperature,which follows the Efros-Shkloskii variable range hopping law and the Arrhenius law.We believe that the rough surface may be useful in device design.

【Abstract】 La2/3Sr1/3MnO3 films are deposited on(001) silicon substrates,in which the silicon surfaces have artificially been treated into the scallops-like,pyramid-like,and smooth polishing structure,by pulsed laser deposition.The magnetoresistances of the films on etched substrates under low applied field are very sensitive to the applied field,and much larger(14.3% for acid-etched,and 42.9% for alkali-etched) than that on the polished Si at 5 K.Zero-field-cooled and field-cooled magnetization behaviors are measured and analyzed.Remarkable upturn behaviors in temperature-dependent resistivity for all samples are observed at low temperature,which follows the Efros-Shkloskii variable range hopping law and the Arrhenius law.We believe that the rough surface may be useful in device design.

【基金】 supported by the National Natural Science Foundation of China(Grant Nos.U1332205,11274153,11204124,and 51202108)
  • 【文献出处】 Chinese Physics B ,中国物理B , 编辑部邮箱 ,2016年10期
  • 【分类号】O484
  • 【下载频次】12
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