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Ba0.6Sr0.4TiO3薄膜的耐压特性研究

Study on Voltage-Withstand Property of Ba0.6Sr0.4TiO3 Thin Films

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【作者】 朱斌张洪波王文君李司中赵强陈宏伟杨传仁张继华

【Author】 ZHU Bin,ZHANG Hongbo,WANG Wenjun,LI Sizhong,ZHAO Qiang,CHEN Hongwei,YANG Chuanren,ZHANG Jihua(State Key Lab.of Electronic Thin Films and Integrated Devices,University of Electronic Science and Technology of China,Chengdu 610054,China)

【机构】 电子科技大学 电子薄膜与集成器件国家重点实验室

【摘要】 采用射频磁控溅射法制备了Ba0.6Sr0.4TiO3(BST)薄膜,研究了基片、退火温度及膜厚对薄膜耐压特性的影响。结果显示,铝酸镧(LaAlO3)基片上制备的BST薄膜表面较平整,有较好的耐压;随着退火温度从750℃提高到850℃,BST薄膜晶粒长大,电击穿概率有所增加,750℃是一个较合理的退火温度。在优化的工艺条件下,BST薄膜耐压可达125V/μm。

【Abstract】 Ba0.6Sr0.4TiO3(BST) thin films were prepared by radio-frequency magnetron sputtering method and the effect of the substrate,annealing temperature and film thickness on the voltage-withstand property was studied.The result shows that the BST thin films deposited on LaAlO3 substrates has smoother surface and higher voltage-withstand property.The crystalline grain size of the BST thin film become larger with the annealing temperature increased from 750 ℃ to 850 ℃,and the electrical breakdown probability has been increased to some extent.In our results,750 ℃ is a more reasonable temperature for the films annealing.At the optimized process,BST thin film can withstand more than 125 V/μm.

【基金】 国家自然科学基金资助项目(51172035)
  • 【文献出处】 压电与声光 ,Piezoelectrics & Acoustooptics , 编辑部邮箱 ,2013年01期
  • 【分类号】TB383.2
  • 【被引频次】4
  • 【下载频次】95
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