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AlGaN/GaN MISHEMTs with Sodium-Beta-Alumina as the Gate Dielectrics

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【作者】 田本朗陈超张继华张万里刘兴钊

【Author】 TIAN Ben-Lang;CHEN Chao;ZHANG Ji-Hua;ZHANG Wan-Li;LIU Xing-Zhao;The State Key Laboratory of Electronic Thin Films and Integrated Devices,University of Electron Science and Technology of China;

【机构】 The State Key Laboratory of Electronic Thin Films and Integrated Devices,University of Electron Science and Technology of China

【摘要】 AlGaN/GaN metal-insulator-semiconductor high-electron-mobility transistors(MISHEMTs) with sodium betaalumina(SBA) thin films as the gate dielectrics are studied.AlGaN/GaN metal-semiconductor high-electronmobility transistors(MESHEMTs) and MISHEMTs with AI2O3 thin-film gate dielectrics are also fabricated for comparative study.The MISHEMTs with SBA gate dielectrics show nearly four orders of magnitude lower gate leakage current and an approximately 60%increase in maximum transconductance,indicating that SBA can serve as an effective dielectric for AlGaN/GaN MISHEMTs.However,SBA gate dielectrics result in threshold voltage modulation of AlGaN/GaN MISHEMTs.Compared with those of AlGaN/GaN MESHEMTs,the threshold voltages of AlGaN/GaN MISHEMTs with AI2O3 gate dielectrics shift negatively from-5.5 V to-7.5 V.In contrast with the normally used gate dielectrics,the threshold voltages of MISHEMTs with SBA gate dielectrics shift positively from —5.5 V to —3.5 V.Based on an x-ray photoelectron spectrum study and energy band spectrum calculation,the primary mechanism of the threshold voltage modulation is attributed to the decrease in the surface valence-band maximum and the increase in the barrier height by SBA gate dielectrics.

【Abstract】 AlGaN/GaN metal-insulator-semiconductor high-electron-mobility transistors(MISHEMTs) with sodium betaalumina(SBA) thin films as the gate dielectrics are studied.AlGaN/GaN metal-semiconductor high-electronmobility transistors(MESHEMTs) and MISHEMTs with AI2O3 thin-film gate dielectrics are also fabricated for comparative study.The MISHEMTs with SBA gate dielectrics show nearly four orders of magnitude lower gate leakage current and an approximately 60%increase in maximum transconductance,indicating that SBA can serve as an effective dielectric for AlGaN/GaN MISHEMTs.However,SBA gate dielectrics result in threshold voltage modulation of AlGaN/GaN MISHEMTs.Compared with those of AlGaN/GaN MESHEMTs,the threshold voltages of AlGaN/GaN MISHEMTs with AI2O3 gate dielectrics shift negatively from-5.5 V to-7.5 V.In contrast with the normally used gate dielectrics,the threshold voltages of MISHEMTs with SBA gate dielectrics shift positively from —5.5 V to —3.5 V.Based on an x-ray photoelectron spectrum study and energy band spectrum calculation,the primary mechanism of the threshold voltage modulation is attributed to the decrease in the surface valence-band maximum and the increase in the barrier height by SBA gate dielectrics.

【基金】 Supported by the National Natural Science Foundation of China under Grant Nos 50932002 and 51172035
  • 【文献出处】 Chinese Physics Letters ,中国物理快报(英文版) , 编辑部邮箱 ,2013年02期
  • 【分类号】TN386
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