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Experimental Characterization of Dual-Frequency Capacitively Coupled Plasma with Inductive Enhancement in Argon

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【作者】 柏洋金成刚余涛吴雪梅诸葛兰剑宁兆元叶超葛水兵

【Author】 BAI Yang;JIN Chenggang;YU Tao;WU Xuemei;ZHUGE Lanjian;NING Zhaoyuan;YE Chao;GE Shuibing;School of Physics Science and Technology,Soochow University;Analysis and Testing Center,Soochow University;

【机构】 School of Physics Science and Technology,Soochow UniversityAnalysis and Testing Center,Soochow University

【摘要】 The dual-frequency capacitively coupled plasma(DF-CCP)with inductive enhancement system is a newly designed plasma reactor.Different from the conventional inductively coupled plasma(ICP)reactors,now a radio frequency(rf)power is connected to an antenna placed outside the chamber with a one-turn bare coil placed between two electrodes in DF-CCP.This paper gives a detailed description of its structure.Moreover,investigations on some characteristics of discharges in this apparatus were made via a Langmuir probe.

【Abstract】 The dual-frequency capacitively coupled plasma(DF-CCP) with inductive enhancement system is a newly designed plasma reactor.Different from the conventional inductively coupled plasma(ICP) reactors,now a radio frequency(rf) power is connected to an antenna placed outside the chamber with a one-turn bare coil placed between two electrodes in DF-CCP.This paper gives a detailed description of its structure.Moreover,investigations on some characteristics of discharges in this apparatus were made via a Langmuir probe.

【基金】 supported by ITER Project(Nos.2010GB106000,2010GB106009);National Natural Science Foundation of China(Nos.10975106,11175126,11075114,11204266);Qing Lan Project,the Project Funded by the Priority Academic Program Development of Jiangsu Higher Education Institutions;The Program for Graduates Research&Innovation in University of Jiangsu Province,China(No.CXZZ11-0085)
  • 【文献出处】 Plasma Science and Technology ,等离子体科学和技术(英文版) , 编辑部邮箱 ,2013年10期
  • 【分类号】O53
  • 【被引频次】1
  • 【下载频次】20
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