节点文献
Experimental Characterization of Dual-Frequency Capacitively Coupled Plasma with Inductive Enhancement in Argon
【摘要】 The dual-frequency capacitively coupled plasma(DF-CCP)with inductive enhancement system is a newly designed plasma reactor.Different from the conventional inductively coupled plasma(ICP)reactors,now a radio frequency(rf)power is connected to an antenna placed outside the chamber with a one-turn bare coil placed between two electrodes in DF-CCP.This paper gives a detailed description of its structure.Moreover,investigations on some characteristics of discharges in this apparatus were made via a Langmuir probe.
【Abstract】 The dual-frequency capacitively coupled plasma(DF-CCP) with inductive enhancement system is a newly designed plasma reactor.Different from the conventional inductively coupled plasma(ICP) reactors,now a radio frequency(rf) power is connected to an antenna placed outside the chamber with a one-turn bare coil placed between two electrodes in DF-CCP.This paper gives a detailed description of its structure.Moreover,investigations on some characteristics of discharges in this apparatus were made via a Langmuir probe.
【Key words】 one-turn bare coil; inductively coupled plasma; dual-frequency capacitively coupled plasma; Langmuir probe; electron energy probability function;
- 【文献出处】 Plasma Science and Technology ,等离子体科学和技术(英文版) , 编辑部邮箱 ,2013年10期
- 【分类号】O53
- 【被引频次】1
- 【下载频次】20