【摘要】 利用高功率磁控溅射(HPPMS)技术在无偏压及室温条件下,采用(Ti,Si10at%)靶在AZ31镁合金基体上制备了Ti-Si-N涂层,在基体与涂层之间插入Ti-Si及TiN层分别作为过渡层及缓冲层,对不同氮气流量下制备的涂层显微结构及纳米硬度进行了研究。实验表明:在AZ31软基体上可制备超硬度Ti-Si-N涂层,随着氮气流量增加膜中N含量增高,涂层颗粒尺寸远小于DCMS电源模式,当氩气氮气流量比为11∶5时TiN(200)出现择优取向,纳米压痕最大硬度值达48 GPa,远高于DCMS涂层硬度(33 GPa)。更多还原

【Abstract】 Ti-Si-N films were prepared on the AZ31 alloy by high power pulsed magnetron sputtering(HPPMS) at room temperature with different nitrogen gas flow and without bias,and the structure and nano-hardness of the films were studied.A Ti-Si and a TiN films were prepared as interlayer and buffer between the films and substrates,respectively.The N contents of the films increase with the decrease of the flow ratio of Ar to N.Compared with the film prepared by DCMS,the film deposited by HPPMS with the ratio of Ar to N of 11/5 shows a highly(200) preferred orientation,a super hardness with the nanohardness of 48GPa and a small particle size on the film surface.更多还原