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方形基片旋涂法镀疏水性二氧化硅减反膜(英文)

Spinning Sol-Gel Hydrophobic Silica Antireflective Coating on Square Substrates

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【作者】 沈斌李海元熊怀唐永兴

【Author】 Shen Bin;Li Haiyuan;Xiong Huai;Tang Yongxingi;National Laboratory on High Power Laser Physics,Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Science;

【机构】 中国科学院上海光学精密机械研究所 高功率激光物理国家实验室

【摘要】 在方形基片上通过旋涂法制备了疏水性膜层。研究了减小几何效应和伯努利效应对膜层均匀性的影响。结果表明,疏水性氧化硅溶胶具有良好的稳定性。疏水性氧化硅膜层即使不进行热处理也有良好的防潮性能。在室温下和超过90%相对湿度环境下的膜层透过率分别达到99.5%和99%,水接触角分别达到1 36°和139°。关于改性溶胶,刚制备完成测得的平均粒度是35.27 nm,放置50天后测得的平均粒度是37.15 nm。

【Abstract】 The paper discussed how to reduce the geometrical effect and Bernoulli Effect by spinning sol-gel hydrophobic coating on square substrates and eventually acquired ideal experiment results.Also,the paper concluded that hydrophobic silica sol possesses good stability.The hydrophobic silica antireflective coating has superiority on moisture-resistant property even without heat treatment.The transmission of the coating at room temperature and under the condition of the exceed 90%relative humidity reaches 99.5%and 99%,the contact angle of coating with water reaches 136° and 139°,respectively.About the modified sol,the average diameter of the silicon particles is 35.27 nm,and it is 37.15 nm which is measured 50 d later.

  • 【文献出处】 稀有金属材料与工程 ,Rare Metal Materials and Engineering , 编辑部邮箱 ,2012年S3期
  • 【分类号】TB306
  • 【被引频次】1
  • 【下载频次】118
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