【摘要】 为提高碳/碳复合材料抗氧化性能,以甲基三氯硅烷(MTS)为先驱体,利用低压化学气相沉积(LPCVD)技术在碳/碳复合材料表面制备SiC-MoSi2涂层,通过XRD和SEM分析了不同沉积温度下涂层结构、物相组成及其沉积机理。结果表明,沉积温度对涂层的成分、结构及致密度有较大影响,在1100～1250℃均可成功得到SiC-MoSi2涂层,1100℃所得涂层结构疏松多孔;1250℃制备的涂层中间部位孔隙较多,表层为致密SiC涂层;1150～1200℃之间可得到均匀致密、以MoSi2颗粒为分散相、以CVD-SiC为连续相的SiC-MoSi2双相陶瓷涂层。更多还原

【Abstract】 In order to improve the anti-oxidation of C/C composites,SiC-MoSi2 coating was prepared by low pressure chemical vapor deposition(LPCVD) using methyltrichlorosilane(MTS) as precursor.The morphologies,composition and deposition mechanism of the coating were analyzed by scanning electron microscope(SEM) and X-ray diffraction(XRD).The results show that the deposition temperature has a great effect on the morphologies,composition and density of the coating.SiC-MoSi2 coating can be successfully produced during 1100℃ to 1250℃.The structure of the as-deposited coating is loose and brittle at 1100℃.And the middle of the layer is porous while dense in the outer layer that made up of SiC at 1250℃.In the temperature range of 1150-1200℃,uniform,dense SiC-MoSi2 dual phase ceramic coating can be obtained whose disperse phase is MoSi2 particles and continuous phase is CVD-SiC.更多还原