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磁控溅射Zr-Ti薄膜的组织结构与血液相容性
Microstructure and Blood Compatibility of Zr-Ti Film Deposited by Magnetron Sputtering
【摘要】 通过直流平衡磁控溅射法在NiTiSMA表面生成Zr-Ti膜,用SEM、XRD和XPS分析证实制备的Zr-Ti膜呈现晶带T型结构,组织保持了细小致密的纤维状特征,与基底结合良好,并且出现了少量生物惰性ZrO2和TiO2陶瓷相。通过测定溶血率研究血小板黏附行为,评估血液相容性。结果表明,与NiTi基底相比,Zr-Ti膜的溶血率更低,表面黏附的血小板数量减少,能够改善NiTiSMA基底的血液相容性。最后,对磁控溅射沉积Zr-Ti膜的成膜机理进行了探讨。
【Abstract】 Zr-Ti film was deposited on the surface of NiTi shape memory alloy(SMA) by balanced magnetron DC sputtering.The results of SEM,XRD and XPS indicate that the Zr-Ti film has the T-type crystal band structure with a fine and dense fibre character.The film has a good combination with NiTi substrate and a small amount of bioinert ZrO2 and TiO2 ceramics phases is found in the film.Blood compatibility was evaluated by hemolysis test and platelet adhesion test.The hemolysis of Zr-Ti film is less than that of NiTi SMA.And the number of platelets on the sample surface is also less than that of Zr-Ti film,which indicates the blood compatibility of NiTi SMA could be improved by the Zr-Ti film.Finally the depositing mechanism of the Zr-Ti film by magnetron sputtering was discussed.
- 【文献出处】 稀有金属材料与工程 ,Rare Metal Materials and Engineering , 编辑部邮箱 ,2011年03期
- 【分类号】R318.08
- 【被引频次】4
- 【下载频次】150