节点文献
化学气相沉积法制备钨管性能研究
The Research of Performance of Tungsten Tube Prepared by Chemical Vapor Deposition
【摘要】 以WF6、H2为原料,采用化学气相沉积法沉积制备出不同直径难熔金属钨管。对不同沉积温度(500℃,600℃,700℃)沉积制备钨管的纯度、密度、显微硬度、残余应力及钨管强度进行了测试与分析研究。研究结果表明:沉积制备钨管具有高纯度和高致密度;随着沉积温度、钨管半径(3~20 mm)不同,显微硬度值在500~800 HV之间;沿钨管圆周、半径方向存在较大残余应力;抗拉强度范围在300~500 MPa.
【Abstract】 Refractory metal tungsten tubes of different diameter have been prepared successfully by chemical vapor deposition with the mixture of WF6 and H2.The purity,density,micro-hardness,residual stress and strength of tungsten tubes at different deposition temperatures(500℃,600℃,700℃) were tested and analyzed.The results show that tungsten tubes prepared in this way demonstrate high purity and high density.At different deposition temperatures,micro-hardness values of tungsten tube of different radius(3-20mm) change between 500 and 800HV.A relatively high residual stress exists along the tungsten tube circumference,radius of the direction.And the tensile strength range is 300-500MPa.
【Key words】 metallic material; CVD; tungsten; microstructure; performance;
- 【文献出处】 兵工学报 ,Acta Armamentarii , 编辑部邮箱 ,2011年06期
- 【分类号】TG146.411
- 【被引频次】5
- 【下载频次】250