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VDMOS器件总剂量辐照阈值电压影响因素分析

Threshold Voltage Influencing Factor in VDMOS Devices Total Dose Radiation

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【作者】 熊燕赖于树

【Author】 XIONG Yan LAI YU-shu(School of Physical and Electronic Engineering,Chongqing Three Gorges University,Wanzhou 404100,Chongqing)

【机构】 重庆三峡学院物理与电子工程学院

【摘要】 介绍了利用γ射线在不同偏置电压和不同辐照温度条件下,对不同导电沟道功率VDMOS器件进行总剂量辐照实验,从而分析研究这两种情况下器件总剂量辐照阈值电压的漂移情况.根据实验数据结合VDMOS器件物理特性分析得出:偏置电压相同时,导电沟道不同其阈值电压的漂移不同,而低温辐照则使得阈值电压漂移更加严重.

【Abstract】 This paper introduces total dose radiation experiment according to different electric conduction channel VDMOS device by using x-ray,under both different bias voltage and different exposure temperature condition,thus analyzing its total dose radiation threshold voltage drifting in both cases.According to the empirical datum and component VDMOS physical property,it draws a conclusion that on the same bias voltage,electric conduction channel is different and thus its threshold voltage drifts is different;but on the other hand the low temperature exposure makes threshold voltage drifting more serious.

  • 【文献出处】 重庆三峡学院学报 ,Journal of Chongqing Three Gorges University , 编辑部邮箱 ,2010年03期
  • 【分类号】TN386
  • 【被引频次】3
  • 【下载频次】140
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