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Reactive magnetron sputtering of germanium carbide films at different substrate temperature

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【作者】 胡超权王艳辉郭龙飞郑伟涛

【Author】 HU Chao-quan,WANG Yan-hui,GUO Long-fei,ZHENG Wei-tao (Dept. of Materials Science,Key Laboratory of Mobile Materials,MOE,State Key Laboratory of Superhard Materials,State Key Laboratory on Integrated Optoelectronics,and College of Electronic Science and Engineering,Jilin University,Changchun 130012,China)

【机构】 Dept. of Materials Science,Key Laboratory of Mobile Materials,MOE,State Key Laboratory of Superhard Materials,State Key Laboratory on Integrated Optoelectronics,and College of Electronic Science and Engineering,Jilin University

【摘要】 To explore the relationship between the chemical bonding and mechanical properties for germanium carbide (Ge1-xCx) films,the Ge1-xCx films are prepared via reactive magnetron sputtering in a mixture of CH4/Ar discharge,and their composition,chemical bonding and hardness were investigated as a function of substrate temperature (Ts). The results show that Ts remarkably influences the chemical bonding of Ge1-xCx film,which results in a pronounced change in the film hardness. As Ts increases from ambient (60 ℃) to 500 ℃,the Ge content in the film gradually increases,which promotes forming sp3 C-Ge bonds in the film at the expense of sp2C-C bonds. Furthermore,it is found that with increasing Ts the fraction of C-H bonds in Ge1-xCx film gradually decreases,which is attributed to an enhancement in the desorption rate of C-Hn(n=1,2,3) species decomposed from methane. The transition from graphite-like sp2 C-C to diamond-like sp3C-Ge bonds as well as the reduction in C-H bonds in the film with increasing Ts promotes forming the compact three-dimensional network structure,which significantly enhances the hardness of the film from 5.8 to 10.1 GPa.

【Abstract】 To explore the relationship between the chemical bonding and mechanical properties for germanium carbide (Ge1-xCx) films,the Ge1-xCx films are prepared via reactive magnetron sputtering in a mixture of CH4/Ar discharge,and their composition,chemical bonding and hardness were investigated as a function of substrate temperature (Ts). The results show that Ts remarkably influences the chemical bonding of Ge1-xCx film,which results in a pronounced change in the film hardness. As Ts increases from ambient (60 ℃) to 500 ℃,the Ge content in the film gradually increases,which promotes forming sp3 C-Ge bonds in the film at the expense of sp2C-C bonds. Furthermore,it is found that with increasing Ts the fraction of C-H bonds in Ge1-xCx film gradually decreases,which is attributed to an enhancement in the desorption rate of C-Hn(n=1,2,3) species decomposed from methane. The transition from graphite-like sp2 C-C to diamond-like sp3C-Ge bonds as well as the reduction in C-H bonds in the film with increasing Ts promotes forming the compact three-dimensional network structure,which significantly enhances the hardness of the film from 5.8 to 10.1 GPa.

【基金】 Sponsored by the National Natural Science Foundation of China ( Grant No. 50525204 and 50832001);the special Ph.D. Program ( Grant No.200801830025) from MOE;the "211" and "985" Project of Jilin University, China;the program for Changjiang Scholars and Innovative Research Teamin University;Science Frontier and Cross-disciplinary Innovation Project of Jilin University, China (Grant No. 200903022)
  • 【文献出处】 Journal of Harbin Institute of Technology ,哈尔滨工业大学学报(英文版) , 编辑部邮箱 ,2010年03期
  • 【分类号】O484.5
  • 【下载频次】52
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