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电子束熔炼多晶硅对杂质铝去除机制研究

Investigation on Removal of Aluminum Impurity in Metallurgical Grade Silicon by Electron Beam Melting

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【作者】 姜大川董伟谭毅王强彭旭李国斌

【Author】 JIANG Da-chuan1,2,DONG Wei1,2,TAN Yi1,2,WANG Qiang1,2,PENG Xu1,2,LI Guo-bin1 (1 Key Laboratory for Solar Energy Photovoltaic System of Liaoning Province,Dalian 116085,Liaoning,China;2 School of Materials Science and Engineering,Dalian University of Technology,Dalian 116085,Liaoning,China)

【机构】 辽宁省太阳能光伏系统重点实验室大连理工大学材料学院

【摘要】 采用电子束熔炼方式,利用铝的蒸发系数较大的特点通过蒸发去除硅中的杂质铝。将实验的实测值与理论计算的蒸发量、损失量等加以比较,得到了铝在电子束下的蒸发去除速率由其在硅中扩散过程所决定的结论,并对铝的去除量与硅的损失量之间关系进行分析。

【Abstract】 Aluminum impurity with high vapor pressure in metallurgical grade silicon was removed effectively by electron beam melting.Comparing the calculated value and the measure evaporation loss,the mechanism of aluminum evaporation through the surface of the molten silicon can be assumed that the removal rate-limiting step of aluminum impurity in silicon is diffusion step.In addition,the relationship between the removal amount of the aluminum and silicon loss is also discussed.

【关键词】 多晶硅电子束熔炼
【Key words】 metallurgical grade siliconaluminumelectron beam melting
【基金】 辽宁省重大攻关计划资助项目(2006222007)
  • 【文献出处】 材料工程 ,Journal of Materials Engineering , 编辑部邮箱 ,2010年08期
  • 【分类号】TF821
  • 【被引频次】21
  • 【下载频次】267
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