【摘要】 为了研究掺杂钨丝(真空镀铬加热元件)表面电解沉积一定厚度(≥100μm)金属铬的工艺,详细考察了不同温度、电流密度、沉积时间等对镀层的影响,并对镀层进行了性能测试。结果表明,最佳工艺条件为:铬酐150~180g/L,硫酸1.5~1.8g/L,稀土(La3+)添加剂0.5~1.5g/L,温度为55℃,电流密度为8~10A/dm2,电镀时间3h。此工艺条件下所得镀层光亮,色泽好,厚度可达100μm,且镀层耐蚀性好,结合力高。更多还原

【Abstract】 A chromium coating with thickness of 100μm was electrodeposited on adulterate tungsten filament.The temperature,current density,deposition time,corrosion resistance,adhesion of the chromium coating was studied.The result shows that when CrO3 concentration is 150～180g/L,H2SO4 is 1.5～1.8g/L,rare earth(La 3+) additives is 0.5～1.5g/L,temperature of the plating liquid is 55℃,current density is 8～10 A/dm 2,deposit time gets 3 hours,thickness of chromium coating can get 100μm,plating is brightness and fine colour and texture.And the chromium coating has good adhesion and corrosion resistance.更多还原