【摘要】 以正硅酸乙酯为原料,利用微波等离子体化学气相沉积法在低温条件下在Si基片上制备了SiO2膜,着重研究了正硅酸乙酯注入位置对SiO2膜结构的影响.实验表明,在利用等离子体化学气相沉积法制备SiO2膜时,表面反应是低温条件下获得高质量膜的重要条件之一;同时射频偏压的使用有利于提高膜的致密度.更多还原

【Abstract】 Tetraethylorthosilicate(TEOS) was used as raw material,and silica films were synthesized through microwave plasma chemical vapor deposition at low temperature.The effects of the injection point and the radio frequency bias on the structure of the silica films were discussed.From the research results,it can be concluded that surface reactions is the prerequisite for the synthesis of high quality silica film.更多还原