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Ag溅射参数对FePt/Ag薄膜取向生长的影响
Effects of Sputtering Factors on Ag on the FePt/Ag Thin Films Tropism Growing
【摘要】 采用有交互作用的正交实验方法对磁控溅射法在玻璃基片上制备FePt/Ag纳米双层膜Ag底层的溅射参数进行研究.通过直观分析,方差分析和XRD图分析,可以选出Ag底层诱导FePt层取向生长的最佳溅射条件,为FePt磁性层性能的进一步研究应用奠定了基础.
【Abstract】 The sputtering factor of Ag underlayer with FePt/Ag douberlayer were deposited on the glass substrate by magnetron sputtering was researched through orthogonal experiment design with interaction effect.We can pick up the best factor of Ag which effect FePt tropism by intuitionist analysis,square variance analysis and XRD it is prepared for the further study and application of FePt magnetism layer′s performance.
【关键词】 FePt/Ag双层膜;
溅射参数;
正交实验;
【Key words】 FePt/Ag doublerlayer films; sputtering factors; orthogonal experiment;
【Key words】 FePt/Ag doublerlayer films; sputtering factors; orthogonal experiment;
- 【文献出处】 山西师范大学学报(自然科学版) ,Journal of Shanxi Normal University(Natural Science Edition) , 编辑部邮箱 ,2007年01期
- 【分类号】O484.1
- 【下载频次】78