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真空蒸馏法制备高纯碲

Preparation of High Purity Tellurium by Vacuum Distillation Technique

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【作者】 高远吴昊程华月蒋玉思

【Author】 GAO Yuan,WU Hao,CHENG Hua-yue,JIANG Yu-si(Research Department of Rare Metal,Guangzhou Research Institute of Non-ferrous Metals,Guangzhou 510650,China)

【机构】 广州有色金属研究院稀有金属研究所广州有色金属研究院稀有金属研究所 广州510650广州510650

【摘要】 采用真空蒸馏法提纯4N(99.99%)碲,在550℃、0.5Pa的动态真空条件下,大部分杂质从86×10-6降到7×10-6。延长冷凝段长度,蒸汽压比碲高的杂质(除Se外),即Cd、Zn和As明显减少。5N(99.999%)碲总的收率达到97%,平均蒸馏速度1.4×10-4g/(cm2.s)。

【Abstract】 The 4N(99.99%) tellurium is purified by vacuum distillation under 550℃ and 0.5 Pa,the majority impurities were drastically reduced from 86×106·to 7×10-6.High vapour pressure impurities except Se in tellurium melt, namely Cd,Zn and As were considerably reduce in extending condensation segment.The overall yield rate of 5N(99.999%) tellurium was up to 97% at an average distillation rate of 1.4×10-4 g/(cm2·s).

【关键词】 提纯真空蒸馏ICP-OES分析
【Key words】 TelluriumPurificationVacuum distillationICP-OES analysis
  • 【文献出处】 有色金属(冶炼部分) ,Nonferrous Metals(Extractive Metallurgy) , 编辑部邮箱 ,2007年01期
  • 【分类号】TF131.2
  • 【被引频次】14
  • 【下载频次】457
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