【摘要】 有机发光显示器件是目前平板显示中的热点,所用ITO玻璃比液晶显示所用的有更高更严的要求。该文探讨了OLED用ITO玻璃生产的相关工艺,得出使用直流溅射ITO陶瓷靶时,较好的气氛是低氩微氧,功率约200W左右,溅射时基板温度约250℃,高温无氧退火。得到方阻20?以下、平均透过率大于80%的ITO玻璃。更多还原

【Abstract】 Low resistivity Indium Tin Oxide (ITO) films were deposited by DC magnetron sputtering using ITO targets. Films deposited at substrate temperature of 250℃ with 200 W input DC power, in an oxygen/argon atmosphere, argon flow was kept at about 16 sccm and the oxygen flow was less than 1sccm, respectively. Annealing of the ITO films without oxygen for 1 h was necessary for achieving low resistivities. Low resistivity (<20 Ω) and high transmittance (>80%) in visible region were found to occur at a high annealing temperature about 350℃.更多还原