节点文献
填充因子对K-V分布束晕-混沌控制效果的影响
Impact of Filling Factor on Beam Halo-chaos Control Effects in K-V Distribution
【摘要】 系统地研究了周期磁聚焦束流传输网络中填充因子对强流离子加速器K V分布束晕 混沌控制效果的影响。通过数值模拟,确定了束晕 混沌控制效果较好的填充因子的取值范围为 0.75~0.99,从而把以往填充因子只凭经验取个别值的研究扩大到可在一个较大的范围取值。另外,还发现了填充因子取值为0.59~0.67时束截面上离子数密度分布由均匀分布变为沿径向出现一峰状分布现象,从而为离子束应用提供了新的参考。
【Abstract】 The effect of the filling factor on beam halo-chaos control for K-V distribution was studied. By numerical simulation, it is found that when the filling factor takes range value from 0.75 to 0.99, the control effect is well. Thus, the range of filling factor values are extended obviously. In addition, it is discovered that the ion density distribution along the radius and the beam section has a peak, although it is uniform initially. The study provides a new guidance for ion beam’s application.
【关键词】 填充因子;
强流加速器;
KV分布;
束晕混沌;
束流传输网络(通道);
【Key words】 filling factor; high intensity accelerator; K-V distribution; beam halo-(chaos); beam transport network;
【Key words】 filling factor; high intensity accelerator; K-V distribution; beam halo-(chaos); beam transport network;
【基金】 国家自然科学基金资助重点基金资助项目(70431002);国家自然科学基金资助项目(70371068;10247005)
- 【文献出处】 原子能科学技术 ,Atomic Energy Science and Technology , 编辑部邮箱 ,2005年01期
- 【分类号】TL50
- 【被引频次】12
- 【下载频次】62