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图形反转双层光刻胶金属剥离技术
Reverse pattern double layers of resist lift off technology
【摘要】 金属剥离技术是用于空间用太阳电池电极的关键工艺技术。为了实现真空蒸镀直接剥离7 mm金属层的目的,开发了图形反转双层光刻胶金属剥离技术。采用图形反转胶和正型光刻胶,实现了理想的光刻胶剖面图形,检测表明金属厚度达到7 μm。此技术已经用于高效太阳电池的批量生产中。空间环模条件考核表明此工艺制作的电极满足空间环境的要求。
【Abstract】 The paper discussed the reverse-pattern photolithography technology that is suitable for lift-off technology in manufacturing of solar cells with thick metal contact. This technology has been used in mass production of solar cells. We presented experimental process as well as the lithography and lift-off results in this paper.
【关键词】 太阳电池;
光刻;
图形反转;
双层光刻胶;
剥离;
【Key words】 solar cells; photolithography; reverse-pattern; dual layer resist; lift-off;
【Key words】 solar cells; photolithography; reverse-pattern; dual layer resist; lift-off;
- 【文献出处】 电源技术 ,Chinese Journal of Power Sources , 编辑部邮箱 ,2005年03期
- 【分类号】TM914.4
- 【被引频次】12
- 【下载频次】687