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MOS器件多晶硅栅量子效应的解析模型

An Analytical Model for Polysilicon Quantization in MOS Devices

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【作者】 代月花; 陈军宁; 柯导名; 孙家讹; 徐超;

【Author】 Dai Yuehua,Chen Junning,Ke Daoming,Sun Jiae,and Xu Chao(School of Electrical Science and Technology,Anhui University,Hefei 230039,China)

【机构】 安徽大学电子科学与技术学院; 安徽大学电子科学与技术学院 合肥230039; 合肥230039; 合肥230039;

【摘要】 根据载流子分布曲线近似,通过求解泊松方程,对多晶硅中的量子效应进行建摸,得出了一个基于物理的解析模型,该模型仅仅通过两个拟合参数可以将多个分散的状态模型简化为一个统一的模型.利用该模型对阈值电压进行了计算,其结果与数值模拟结果相吻合,证明了该模型的正确性和准确性.

【Abstract】 This paper proposes a model for polysilicon quantum effects in MOSFETs.Based on the least-squares curve fit,electron distribution functions are obtained.Then,solving Possion equations,a physically based analytical model is described.There are only two fitting parameters in the new model that can be used to describe different states such as accumulation,threshold,and strong inversion.However,different models used to depict those as different states,respectively.Additionally threshold voltages with the new model are calculated and compared with the numerical simulation results.The good agreement between them proves that the new model is correct and exact.

【基金】 国家自然科学基金(批准号:60276042);安徽省自然科学基金(批准号:01044104);安徽省教育厅(批准号:2003kj0012d)资助项目~~
  • 【文献出处】 半导体学报 ,Chinese Journal of Semiconductors , 编辑部邮箱 ,2005年11期
  • 【分类号】TN386.1
  • 【被引频次】1
  • 【下载频次】225
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