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重氮树脂单层膜上铜的无电沉积
Electroless Deposition of Cu on DR Monolayer
【摘要】 组装于硅片或玻璃片基片上的重氮树脂(DR)单层膜,吸附Sncl2,Pd催化剂后,通过无电沉积的方法,在这些基片上制备了铜膜.对得到的铜膜进行了SEM,XRD表征.通过选择性无电沉积,成功地制备了铜膜图像.
【Abstract】 The electroless deposition of copper on the monolayer film of diazoresin (DR), which was fabricated on the silicon or glass surface, was performed via absorbing SnCl 2 and Pd on the DR film. The copper film was characterized with SEM and XRD showing that the electroless deposition of copper on the substrate is successful. Through the selective electroless deposition the Cu film pattern was obtained.
【关键词】 重氮树脂;
无电沉积;
铜膜;
铜膜图像;
【Key words】 diazoresin; electroless deposition; Cu film; Cu film pattern;
【Key words】 diazoresin; electroless deposition; Cu film; Cu film pattern;
【基金】 国家自然科学基金(No.50173002)资项目助.
- 【文献出处】 化学学报 ,Acta Chimica Sinica , 编辑部邮箱 ,2004年21期
- 【分类号】TN304
- 【被引频次】2
- 【下载频次】138