【摘要】 多孔硅作为一种牺牲层材料 ,在表面硅微机械加工技术中有着重要的应用。文中综合讨论了三种不同的多孔硅牺牲层技术 ,并用后两种“在低掺杂衬底上的多孔硅牺牲层技术”,制作了良好的悬空微薄膜结构 ,同时对多孔硅表面的薄膜淀积 ,和制备过程中的掩膜材料等进行了分析 ,为利用多孔硅工艺制作各种 MEMS器件奠定了基础。更多还原

【Abstract】 Porous silicon used as a sacrificial layer has some important applications in surface micromachining technology. Three different processes based on porous silicon as a sacrificial layer are discussed in detail. Freestanding microstructures are fabricated with the latter two separate techniques, then the deposition of film on the surface of porous silicon and masking layer in the fabrication of porous silicon are analyzed. All these provide solid foundation of fabricating diverse freestanding microstructures.更多还原